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Volumn 101, Issue 1, 2012, Pages

Chemical diffusion: Another factor affecting the magnetoresistance ratio in Ta/CoFeB/MgO/CoFeB/Ta magnetic tunnel junction

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL DIFFUSION; ELEMENTAL CONTENTS; MAGNETIC TUNNEL JUNCTION; MAGNETORESISTANCE RATIO; MEAN INNER POTENTIAL; MGO BARRIER; POST-ANNEALED SAMPLES; TUNNEL MAGNETORESISTANCE;

EID: 84863645315     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4732463     Document Type: Article
Times cited : (39)

References (17)
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    • Lichte, H.1    Lehmann, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.