Rf Power dependence on the chemical and structural properties of copper oxide thin films obtained at various oxygen fractions

Applied Surface Science

Volumn 258, Issue 22, 2012, Pages 9054-9057

  Lim, Kyounga ^a   Park, Juyun ^b   Kim, Do Geun ^a   Kim, Jong Kuk ^a   Kang, Jae Wook ^a   Kang, Yong Cheol ^b  

^a Korea Institute of Material Science   (South Korea)

^b Pukyong National University   (South Korea)

Author keywords

Copper oxide; rf Magnetron sputtering; X ray induced Auger electron spectroscopy

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; AUGERS; COPPER OXIDES; MAGNETRON SPUTTERING; OXIDE FILMS; OXYGEN; SCANNING ELECTRON MICROSCOPY; SURFACE RESISTANCE; THIN FILMS; X RAY DIFFRACTION;

COMPOSITIONAL RATIO; COPPER OXIDE THIN FILMS; OXYGEN FRACTIONS; PHYSICAL AND CHEMICAL PROPERTIES; RF POWER DEPENDENCE; RF-MAGNETRON SPUTTERING; SURFACE PROFILERS; X-RAY INDUCED AUGER ELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84863509132     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.05.159     Document Type: Article

References (21)

1. B.S. Li, K. Akimoto, and A. Shen Journal of Crystal Growth 311 2009 1102
2. K. Akimoto, S. Ishizuka, M. Yanagita, Y. Nawa, G.K. Paul, and T. Sakurai Solar Energy 80 2006 715
3. G.K. Paul, R. Ghosh, S.K. Bera, S. Bandyopadhyay, T. Sakurai, and K. Akimoto Chemical Physics Letters 463 2008 117
4. B. Balamurugan, and B.R. Mehta Thin Solid Films 396 2001 90
5. A. Mittiga, E. Salza, F. Sarto, M. Tucci, and R. Vasanthi Applied Physics Letters 88 2006 163502
6. T. Serin, S. Horzum, and Y. Celik Semiconductor Science and Technology 20 2005 398
7. W.-Y. Yang, and S.-W. Rhee Applied Physics Letters 91 2007 232907
8. Y. Yoshida, S. Tanaka, Y. Fujita, and I. Hiromitsu Journal of Applied Physics 106 2009 064510
9. J. Deuermeier, J. Gassmann, J. Brötz, and A. Klein Journal of Applied Physics 109 2011 113704
10. N. Serin, T. Serin, S. Horzum, and Y. Celik Semiconductor Science and Technology 20 2005 398
11. T.S. Nair, L. Guerrero, O.L. Arenas, and P.K. Nair Applied Surface Science 150 1999 143
12. A.E. Rakhshani Solid-State Electronics 29 1986 7
13. S. Izhizuka, S. Kato, T. Maruyama, and K. Akimoto Japanese Journal of Applied Physics 40 2001 2765
14. A.H. Jayatissa, K. Guo, and A.C. Jayasuriya Applied Surface Science 255 2009 9474
15. S.J. Ahn, C.W. Kim, J.H. Yun, J.C. Lee, and K.H. Yoon Solar Energy Materials and Solar Cells 91 2007 1836
16. A.F. Lotus, Y.C. Kang, J.I. Walker, R.D. Ramsier, and G.G. Chase Materials Science and Engineering B 166 2010 61
17. I. Espitia-Cabrera, H.D. Orozco-Hernandez, P. Bartolo-Perez, and M.E. Contreras-Garcia Surface and Coatings Technology 203 2008 211
18. H.J. Li, X.Y. Jiang, W.M. Huang, and X.M. Zheng Energy and Fuels 23 2009 2967
19. C.L. Chu, H.C. Lu, C.Y. Lo, C.Y. Lai, and Y.U. Wang Physica B 404 2009 4831
20. Z. Ai, L. Zhang, S. Lee, and W. Ho Journal of Physical Chemistry C 113 2009 20896
21. S.Y. Lee, M.N. Nguyen, Y.M. Sun, and J.M. White Applied Surface Science 206 2003 102