Oxidation kinetics of nanoscale copper films studied by terahertz transmission spectroscopy

Journal of Applied Physics

Volumn 111, Issue 12, 2012, Pages

  Ramanandan, Gopika K P ^a   Ramakrishnan, Gopakumar ^a   Planken, Paul C M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT AIR; ARRHENIUS EQUATION; COPPER FILMS; COPPER LAYER; COPPER THIN FILM; CUPROUS OXIDE LAYER; ELEVATED TEMPERATURE; HEATING TEMPERATURES; NANO SCALE; OXIDATION KINETICS; PARABOLIC RATE LAW; PARTIAL OXIDATIONS; PERCOLATION THRESHOLDS; PERCOLATION TRANSITION; SILICON SUBSTRATES; TERAHERTZ; TERAHERTZ TRANSMISSION; THIN COPPER FILMS; THZ PULSE; TRANSMISSION SPECTROSCOPY;

ACTIVATION ENERGY; COPPER; ELECTRIC FIELDS; METALLIC FILMS; OPTICAL PROPERTIES; OXIDATION; PERCOLATION (FLUIDS); PERCOLATION (SOLID STATE); THIN FILMS;

TERAHERTZ SPECTROSCOPY;

EID: 84863504933     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4729808     Document Type: Article

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