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Applied Physics Letters

Volumn 100, Issue 25, 2012, Pages

Development of a stable dielectric-barrier discharge enhanced laminar plasma jet generated at atmospheric pressure

(5) Tang, Jie a Li, Shibo a Zhao, Wei a Wang, Yishan a Duan, Yixiang a,b

a XI AN INSTITUTE OF OPTICS AND PRECISION MECHANICS (China)

b SICHUAN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON ATOMS; ATMOSPHERIC-PRESSURE PLASMA SOURCE; CORE REGION; DIELECTRIC-BARRIER DISCHARGES; EMISSION SPECTRUMS; LATERAL DIRECTIONS; NONTHERMAL; PLASMA GENERATION; SUSTAINING VOLTAGE; TOTAL ENERGY CONSUMPTION;

ATMOSPHERIC PRESSURE; EMISSION SPECTROSCOPY; ENERGY UTILIZATION; PLASMAS;

PLASMA DIAGNOSTICS;

EID: 84863308149 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4729818 Document Type: Article

Times cited : (54)

References (31)

1
- 33749237824
- 10.1063/1.2356894
- B. Qi, C. Ren, D. Wang, S. Li, K. Wang, and Y. Zhang, Appl. Phys. Lett. 89, 131503 (2006). 10.1063/1.2356894
- (2006) Appl. Phys. Lett. , vol.89 , pp. 131503
- Qi, B.¹ Ren, C.² Wang, D.³ Li, S.⁴ Wang, K.⁵ Zhang, Y.⁶

2
- 79955409473
- 10.1063/1.3582923
- D. Wang, D. Zhao, K. Feng, X. Zhang, D. Liu, and S. Yang, Appl. Phys. Lett. 98, 161501 (2011). 10.1063/1.3582923
- (2011) Appl. Phys. Lett. , vol.98 , pp. 161501
- Wang, D.¹ Zhao, D.² Feng, K.³ Zhang, X.⁴ Liu, D.⁵ Yang, S.⁶

3
- 77958587192
- 10.1088/1009-0630/12/2/13
- M. Y. Qian, C. S. Ren, D. Z. Wang, Y. Feng, and J. L. Zhang, Plasma Sci. Technol. 12, 561 (2010). 10.1088/1009-0630/12/2/13
- (2010) Plasma Sci. Technol. , vol.12 , pp. 561
- Qian, M.Y.¹ Ren, C.S.² Wang, D.Z.³ Feng, Y.⁴ Zhang, J.L.⁵

4
- 77952968638
- 10.1063/1.3430008
- J. Tang, Y. Duan, and W. Zhao, Appl. Phys. Lett. 96, 191503 (2010). 10.1063/1.3430008
- (2010) Appl. Phys. Lett. , vol.96 , pp. 191503
- Tang, J.¹ Duan, Y.² Zhao, W.³

5
- 33645516160
- 10.1063/1.2161807
- Q. S. Yu, C. Huang, F.-H. Hsieh, H. Huff, and Y. Duan, Appl. Phys. Lett. 88, 013903 (2006). 10.1063/1.2161807
- (2006) Appl. Phys. Lett. , vol.88 , pp. 013903
- Yu, Q.S.¹ Huang, C.² Hsieh, F.-H.³ Huff, H.⁴ Duan, Y.⁵

6
- 34047161736
- 10.1063/1.2409624
- Y. Duan, C. Huang, and Q. Yu, Rev. Sci. Instrum. 78, 015104 (2007). 10.1063/1.2409624
- (2007) Rev. Sci. Instrum. , vol.78 , pp. 015104
- Duan, Y.¹ Huang, C.² Yu, Q.³

7
- 27744600089
- 10.1088/0963-0252/14/4/009
- D. Staack, B. Farouk, A. Gutsol, and A. Fridman, Plasma Sources Sci. Technol. 14, 700 (2005). 10.1088/0963-0252/14/4/009
- (2005) Plasma Sources Sci. Technol. , vol.14 , pp. 700
- Staack, D.¹ Farouk, B.² Gutsol, A.³ Fridman, A.⁴

8
- 68349141457
- 10.1063/1.3187939
- B. L. Sands, S. K. Huang, and B. N. Ganguly, Appl. Phys. Lett. 95, 051502 (2009). 10.1063/1.3187939
- (2009) Appl. Phys. Lett. , vol.95 , pp. 051502
- Sands, B.L.¹ Huang, S.K.² Ganguly, B.N.³

9
- 69049107571
- 10.1063/1.3194298
- C. S. Ha, J. Y. Choi, D. H. Kim, C.H. Park, H. J. Lee, and H. J. Lee, Appl. Phys. Lett. 95, 061502 (2009). 10.1063/1.3194298
- (2009) Appl. Phys. Lett. , vol.95 , pp. 061502
- Ha, C.S.¹ Choi, J.Y.² Kim, D.H.³ Park, C.H.⁴ Lee, H.J.⁵ Lee, H.J.⁶

10
- 79251644763
- 10.1016/j.proci.2010.06.024
- X. Rao, K. Hemawan, I. Wichman, T. Grotjohn, and J. Asmussen, Proc. Comb. Inst. 33, 3233 (2010). 10.1016/j.proci.2010.06.024
- (2010) Proc. Comb. Inst. , vol.33 , pp. 3233
- Rao, X.¹ Hemawan, K.² Wichman, I.³ Grotjohn, T.⁴ Asmussen, J.⁵

11
- 0031276277
- 10.1088/0963-0252/6/4/003
- K. H. Schoenbach, A. El-Habachi, W. Shi, and M. Ciocca, Plasma Sources Sci. Technol. 6, 468 (1997). 10.1088/0963-0252/6/4/003
- (1997) Plasma Sources Sci. Technol. , vol.6 , pp. 468
- Schoenbach, K.H.¹ El-Habachi, A.² Shi, W.³ Ciocca, M.⁴

12
- 0001112601
- 10.1063/1.124174
- R. H. Stark and K. H. Schoenbach, Appl. Phys. Lett. 74, 3770 (1999). 10.1063/1.124174
- (1999) Appl. Phys. Lett. , vol.74 , pp. 3770
- Stark, R.H.¹ Schoenbach, K.H.²

13
- 67049154458
- 10.1063/1.3130183
- S. Kiriu, H. Miyazoe, F. Takamine, M. Sai, J. H. Choi, T. Tomai, and K. Terashima, Appl. Phys.Lett. 94, 191502 (2009). 10.1063/1.3130183
- (2009) Appl. Phys.Lett. , vol.94 , pp. 191502
- Kiriu, S.¹ Miyazoe, H.² Takamine, F.³ Sai, M.⁴ Choi, J.H.⁵ Tomai, T.⁶ Terashima, K.⁷

14
- 79960607699
- 10.1063/1.3599845
- Q. Li, H. Takana, Y. Pu, and H. Nishiyama, Appl. Phys. Lett. 98, 241501 (2011). 10.1063/1.3599845
- (2011) Appl. Phys. Lett. , vol.98 , pp. 241501
- Li, Q.¹ Takana, H.² Pu, Y.³ Nishiyama, H.⁴

15
- 77950563331
- 10.1063/1.3360932
- Y. Xian, X. Lu, Z. Tang, Q. Xiong, W. Gong, D. Liu, Z. Jiang, and Y. Pan, J. Appl. Phys. 107, 063308 (2010). 10.1063/1.3360932
- (2010) J. Appl. Phys. , vol.107 , pp. 063308
- Xian, Y.¹ Lu, X.² Tang, Z.³ Xiong, Q.⁴ Gong, W.⁵ Liu, D.⁶ Jiang, Z.⁷ Pan, Y.⁸

16
- 81255149114
- 10.1109/TPS.2011.2148180
- X. Rao, S. Hammack, C. Carter, and T. Lee, IEEE Trans. Plasma Sci. 39, 2354 (2011). 10.1109/TPS.2011.2148180
- (2011) IEEE Trans. Plasma Sci. , vol.39 , pp. 2354
- Rao, X.¹ Hammack, S.² Carter, C.³ Lee, T.⁴

17
- 79956028728
- 10.1063/1.1468898
- T. Ito and K. Terashima, Appl. Phys. Lett. 80, 2648 (2002). 10.1063/1.1468898
- (2002) Appl. Phys. Lett. , vol.80 , pp. 2648
- Ito, T.¹ Terashima, K.²

18
- 0033730266
- 10.1109/27.842901
- E. E. Kunhardt, IEEE Trans. Plasma Sci. 28, 189 (2000). 10.1109/27.842901
- (2000) IEEE Trans. Plasma Sci. , vol.28 , pp. 189
- Kunhardt, E.E.¹

19
- 12844266095
- 10.1088/0022-3727/38/2/R01
- A. Fridman, A. Chirokov, and A. Gutsol, J. Phys. D: Appl. Phys. 38, R1 (2005). 10.1088/0022-3727/38/2/R01
- (2005) J. Phys. D: Appl. Phys. , vol.38 , pp. 1
- Fridman, A.¹ Chirokov, A.² Gutsol, A.³

20
- 0032022902
- 10.1063/1.367051
- F. Massines, A. Rabehi, P. Descomps, R. B. Gadri, P. Segur, and C. Mayoux, J. Appl. Phys. 83, 2950 (1998). 10.1063/1.367051
- (1998) J. Appl. Phys. , vol.83 , pp. 2950
- Massines, F.¹ Rabehi, A.² Descomps, P.³ Gadri, R.B.⁴ Segur, P.⁵ Mayoux, C.⁶

21
- 68349085546
- 10.1051/epjap/2009064
- F. Massines, N. Gherardi, N. Naude, and P. Segur, Eur. Phys. J. Appl. Phys. 47, 22805 (2009). 10.1051/epjap/2009064
- (2009) Eur. Phys. J. Appl. Phys. , vol.47 , pp. 22805
- Massines, F.¹ Gherardi, N.² Naude, N.³ Segur, P.⁴

22
- 84859207465
- 10.1063/1.3672511
- J. Tang, W. Cao, W. Zhao, Y. Wang, and Y. Duan, Phys. Plasmas 19, 013501 (2012). 10.1063/1.3672511
- (2012) Phys. Plasmas , vol.19 , pp. 013501
- Tang, J.¹ Cao, W.² Zhao, W.³ Wang, Y.⁴ Duan, Y.⁵

23
- 36549041386
- 10.1063/1.2819073
- H.Y. Luo, Z. Liang, B. Lv, X. X. Wang, Z. C. Guan, and L.M. Wang, Appl. Phys.Lett. 91, 221504 (2007). 10.1063/1.2819073
- (2007) Appl. Phys.Lett. , vol.91 , pp. 221504
- Luo, H.Y.¹ Liang, Z.² Lv, B.³ Wang, X.X.⁴ Guan, Z.C.⁵ Wang, L.M.⁶

24
- 0037285214
- 10.1023/A:1022470901385
- U. Kogelschatz, Plasma Chem. Plasma Proc. 23, 1 (2003). 10.1023/A:1022470901385
- (2003) Plasma Chem. Plasma Proc. , vol.23 , pp. 1
- Kogelschatz, U.¹

25
- 26444480572
- 10.1070/PU1982v025n05ABEH004552
- E. P. Velikhov, V. S. Golubev, and S. V. Pashkin, Sov. Phys. Usp. 25, 340 (1982). 10.1070/PU1982v025n05ABEH004552
- (1982) Sov. Phys. Usp. , vol.25 , pp. 340
- Velikhov, E.P.¹ Golubev, V.S.² Pashkin, S.V.³

26
- 0030287120
- 10.1016/S0304-3886(96)00023-X
- A. Jaworek and A. Krupa, J. Electrostatics 38, 187 (1996). 10.1016/S0304-3886(96)00023-X
- (1996) J. Electrostatics , vol.38 , pp. 187
- Jaworek, A.¹ Krupa, A.²

27
- 0033096942
- 10.1109/28.753633
- G. M. Colver and S. El-Khabiry, IEEE Trans. on Indust. Appl. 35, 387 (1999). 10.1109/28.753633
- (1999) IEEE Trans. on Indust. Appl. , vol.35 , pp. 387
- Colver, G.M.¹ El-Khabiry, S.²

28
- 0003839414
- 2nd ed. (Springer, Berlin, Germany)
- Y. P. Raizer, Gas Discharge Physics, 2nd ed. (Springer, Berlin, Germany, 1991).
- (1991) Gas Discharge Physics
- Raizer, Y.P.¹

29
- 79957703002
- 10.1088/0963-0252/20/3/035006
- K. Kutasi, V. Guerra, and P. A. Sa, Plasma Sources Sci. Technol. 20, 035006 (2011). 10.1088/0963-0252/20/3/035006
- (2011) Plasma Sources Sci. Technol. , vol.20 , pp. 035006
- Kutasi, K.¹ Guerra, V.² Sa, P.A.³

30
- 4243379469
- 10.1103/PhysRevA.5.991
- R. S. Van Dyck, Jr., C. E. Johnson, and H. A. Shugart, Phys. Rev. A 5, 991 (1972). 10.1103/PhysRevA.5.991
- (1972) Phys. Rev. A , vol.5 , pp. 991
- Van Dyck, Jr.R.S.¹ Johnson, C.E.² Shugart, H.A.³

31
- 4243117278
- 10.1103/PhysRevLett.70.3545
- H. Katori and F. Shimizu, Phys. Rev. Lett. 70, 3545 (1993). 10.1103/PhysRevLett.70.3545
- (1993) Phys. Rev. Lett. , vol.70 , pp. 3545
- Katori, H.¹ Shimizu, F.²

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