Characterization of stable brush-shaped large-volume plasma generated at ambient air

Physics of Plasmas

Volumn 19, Issue 1, 2012, Pages

  Tang, Jie ^a   Cao, Wenqing ^a   Zhao, Wei ^a   Wang, Yishan ^a   Duan, Yixiang ^a,b  

^a XI AN INSTITUTE OF OPTICS AND PRECISION MECHANICS   (China)

^b SICHUAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT AIR; AMBIENT PRESSURES; APPLIED VOLTAGES; ARGON ATOMS; ARGON FLOW RATE; COMPLICATED STRUCTURES; DC POWER SUPPLIES; DISCHARGE CHARACTERISTICS; DISCHARGE CURRENTS; DISCHARGE POWER; EMISSION PROFILE; FLOWING ARGONS; HIGH TEMPERATURE; NITROGEN MOLECULE; OXYGEN ATOM; PLASMA GAS; PLASMA SIZE; POSITIVE COLUMN; REACTIVE SPECIES; SPECTRAL MEASUREMENT;

ARGON; ATOMS; BRUSHES; EMISSION SPECTROSCOPY; FLOW RATE; FLOWING WELLS; GLOW DISCHARGES;

NITROGEN PLASMA;

EID: 84859207465     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3672511     Document Type: Article

References (27)

1. I. E. Kieft, E. P. van der Laan, and E. Stoffels, New J. Phys. 6, 149 (2004). 10.1088/1367-2630/6/1/149
2. J. Park, I. Henins, H. W. Herrmann, G. S. Selwyn, J. Y. Jeon, R. F. Hicks, D. Shim, C. S. Chang, Appl. Phys.Lett. 76, 288 (2000). 10.1063/1.125724
3. R. H. Stark and K. H. Schoenbach, Appl. Phys.Lett. 74, 3770 (1999). 10.1063/1.124174
4. E. E. Kunhardt, IEEE Trans. Plasma Science 28, 189 (2000). 10.1109/27.842901
5. M. Moisan, Z. Zakrzewski, R. Etemadi, and J. C. Rostaing, J. Appl. Phys. 83, 5691 (1998). 10.1063/1.367423
6. S. Y. Moon, W. Choe, and B. K. Kang, Appl. Phys. Lett. 84, 188 (2004). 10.1063/1.1639135
7. M. Taghioskoui, J. Perlow, M. Zaghloul, and A. Montaser, Appl. Phys. Lett. 96, 191502 (2010). 10.1063/1.3429093
8. J. Tang, Y. Duan, and W. Zhao, Appl. Phys. Lett. 96, 191503 (2010). 10.1063/1.3430008
9. Y. Duan, C. Huang, and Q. Yu, Rev. Sci. Instrum. 78, 015104 (2007). 10.1063/1.2409624
10. Q. S. Yu, C. Huang, F.-H. Hsieh, H. Huff, and Y. Duan, Appl. Phys. Lett. 88, 013903 (2006). 10.1063/1.2161807
11. J. Tang, W. Zhao and Y. X. Duan, Plasma Sources Sci. Technol. 20, 045009 (2011). 10.1088/0963-0252/20/4/045009
12. R. Foest, M. Schmidt and K. Becker, Int. J. Mass Spectrom. 248, 87 (2006). 10.1016/j.ijms.2005.11.010
13. D. Mariotti and R. M. Sankaran, J. Phys. D: Appl. Phys. 43, 323001 (2010). 10.1088/0022-3727/43/32/323001
14. Y. P. Raizer, Gas Discharge Physics, 2nd ed. (Springer, Berlin, Germany, 1991).
15. R.H. Stark and K.H. Schoenbach, J. Appl. Phys. 85, 2075 (1999). 10.1063/1.369505
16. K. H. Becker, K. H. Schoenbach, and J. G. Eden, J. Phys. D: Appl. Phys. 39, R55 (2006). 10.1088/0022-3727/39/3/R01
17. A. Fridman, A. Chirokov, and A. Gutsol, J. Phys. D, Appl. Phys. 38, R1 (2005). 10.1088/0022-3727/38/2/R01
18. A. M. Keszler and L. Nemes, J. Mol. Struct. 695-696, 211 (2004). 10.1016/j.molstruc.2003.11.048
19. J. H. Callomon and A. C. Gilby, Can. J. Phys. 41, 995 (1963). 10.1139/p63-105
20. L. Nemes, A. M. Keszler, J. O. Hornkohl, and C. G. Parigger, Appl. Opt. 44, 3661 (2005). 10.1364/AO.44.003661
21. A. Bogaerts and R. Gijbels, J. Anal. Atomic Spectrom. 13, 721 (1998). 10.1039/a802894j
22. K. Wagatsuma and K. Hirokawa, Anal. Chem. 57, 2901 (1985). 10.1021/ac00291a036
23. A. Bogaerts, R. Gijbels, and J. Vlcek, Spectrochimica Acta Part B 53, 1517 (1998). 10.1016/S0584-8547(98)00139-6
24. D. E. Gray, American Institute of Physics Handbook, 3rd ed. (McGraw Hill, New York, 1972).
25. N. Georgescu, C. P. Lungu, A. R. Lupu, and M. Osiac, IEEE Trans. Plasma Sci. 38, 3156 (2010) 10.1109/TPS.2010.2070811
26. S. J. Northway and R. C. fry, Appl. Spectrosc. 34, 332 (1980). 10.1366/0003702804730501
27. J. Tang, W. Zhao, and Y. Duan, IEEE Trans. Plasma Sci. 38, 3272 (2010). 10.1109/TPS.2010.2084597