Properties of dielectric-barrier-free atmospheric pressure microplasma driven by submicrosecond dc pulse voltage

Applied Physics Letters

Volumn 95, Issue 6, 2009, Pages

  Ha, Chang Seung ^a   Choi, Joon Young ^a   Kim, Dong Hyun ^a   Park, Chung Hoo ^a   Lee, Hae June ^a   Lee, Ho Jun ^a  

^a Pusan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER-FREE; DISCHARGE CURRENTS; EXTERNAL CURRENTS; FEED GAS; FREE METALS; GLOW MODES; MICRO-PLASMAS; OPTICAL EMISSIONS; PULSE VOLTAGE; ROTATIONAL TEMPERATURE; SIMPLE STRUCTURES; SUB-MICROSECOND; VOLTAGE PULSE;

ATMOSPHERIC PRESSURE; ELECTRIC POTENTIAL; GLOW DISCHARGES; HELIUM; PLASMA DEVICES; PLASMA DISPLAY DEVICES;

DIELECTRIC MATERIALS;

EID: 69049107571     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3194298     Document Type: Article

References (15)

1. J. R. Roth, Industrial Plasma Engineering: Principles (Institute of Physics, Philadelphia, 1995).
2. A. Sublet, C. Ding, J. -L. Dorier, Ch. Hollenstine, P. Fayet, and F. Coursimault, Plasma Sources Sci. Technol. 0963-0252 15, 627 (2006). 10.1088/0963-0252/15/4/006 (Pubitemid 44679407)
3. G. Nersisyan and W. G. Graham, Plasma Sources Sci. Technol. 0963-0252 13, 582 (2004). 10.1088/0963-0252/13/4/005
4. I. E. Kieft, E. P. v. d. Laan, and E. Stoffels, New. J. Phys. 6, 149 (2004). 10.1088/1367-2630/6/1/149 1367-2630 (Pubitemid 39587893)
5. V. Leveille and S. Coulombe, Plasma Sources Sci. Technol. 0963-0252 14, 467 (2005). 10.1088/0963-0252/14/3/008 (Pubitemid 41165126)
6. J. L. Walsh, J. J. Shi, and M. G. Kong, Appl. Phys. Lett. 0003-6951 89, 161505 (2006). 10.1063/1.2361274 (Pubitemid 44601654)
7. Q. Wang, F. Doll, V. M. Donnelly, D. J. Economou, N. Sadeghi, and G. F. Franz, J. Phys. D 0022-3727 40, 4202 (2007). 10.1088/0022-3727/40/14/015 (Pubitemid 47134557)
8. C. S. Ha, J. Y. Choi, H. -J. Lee, D. -H. Kim, and H. J. Lee, IEEE Trans. Plasma Sci. 0093-3813 36, 970 (2008). 10.1109/TPS.2008.924267
9. G. Gardet, G. Moulard, M. Courbon, F. Rogemond, and M. Druetta, Meas. Sci. Technol. 0957-0233 11, 333 (2000). 10.1088/0957-0233/11/4/301 (Pubitemid 30255155)
10. N. K. Bibinov, A. A. Fateev, and K. Wiesemann, Plasma Sources Sci. Technol. 0963-0252 10, 579 (2001). 10.1088/0963-0252/10/4/306
11. H. Nassar, S. Pellerin, K. Musiol, O. Martinie, N. Pellerin, and J. -M. Cormier, J. Phys. D 0022-3727 37, 1904 (2004). 10.1088/0022-3727/37/14/005
12. N. Britun, M. Gaillard, A. Richard, Y. M. Kim, K. S. Kim, and J. G. Ham, J. Phys. D 0022-3727 40, 1022 (2007). 10.1088/0022-3727/40/4/016 (Pubitemid 46501524)
13. N. K. Bibinov, A. A. Fateev, and K. Wiesemann, J. Phys. D 0022-3727 34, 1819 (2001). 10.1088/0022-3727/34/12/309
14. J. M. Pouvesle, A. Bouchoule, and J. Stevefelt, J. Chem. Phys. 0021-9606 77, 817 (1982). 10.1063/1.443897
15. G. Schaefer and H. Kirkich, IEEE J. Quantum Electron. 0018-9197 26, 1418 (1990). 10.1109/3.59691