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Volumn 542, Issue , 2012, Pages 57-61
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Thermoelectric properties of n-type Bi-Te thin films with deposition conditions using RF magnetron co-sputtering
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Author keywords
Bismuth tellium; Power factor; RF co sputtering; Thermoelectric thin film
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Indexed keywords
BISMUTH-TELLIUM;
COSPUTTERING;
CRYSTALLINE STRUCTURE;
DEPOSITION CONDITIONS;
DEPOSITION PRESSURES;
ELECTRICAL RESISTIVITY;
GRAIN SIZE;
MAGNETRON CO-SPUTTERING;
POWER FACTORS;
RADIO FREQUENCIES;
RF-MAGNETRON CO-SPUTTERING;
ROOM TEMPERATURE;
SUBSTRATE TEMPERATURE;
THERMOELECTRIC PERFORMANCE;
THERMOELECTRIC PROPERTIES;
THERMOELECTRIC THIN FILMS;
WORKING PRESSURES;
BISMUTH;
DEPOSITION;
ELECTRIC CONDUCTIVITY;
ELECTRIC POWER FACTOR;
THERMOELECTRIC EQUIPMENT;
THERMOELECTRICITY;
THIN FILMS;
VAPOR DEPOSITION;
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EID: 84863299475
PISSN: 00406031
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tca.2012.01.003 Document Type: Conference Paper |
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Times cited : (36)
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References (15)
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