Conduction of topologically protected charged ferroelectric domain walls

Physical Review Letters

Volumn 108, Issue 7, 2012, Pages

  Wu, Weida ^a   Horibe, Y ^a   Lee, N ^a   Cheong, S W ^a   Guest, J R ^b  

^a RUTGERS UNIVERSITY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED FERROELECTRIC DOMAINS; CONDUCTANCE SPECTRA; CONDUCTIVE ATOMIC FORCE MICROSCOPY; FERROELECTRIC DOMAINS; FORWARD BIAS; IN-SITU; KELVIN PROBE FORCE MICROSCOPY; LOW BIAS; LOW TEMPERATURES; MULTIFERROICS; NANOSCALE CONDUCTION; PIEZORESPONSE FORCE MICROSCOPY; POSITIVELY CHARGED; REVERSE BIAS; SEMI-CONDUCTING PROPERTY;

ATOMIC FORCE MICROSCOPY; FERROELECTRICITY; TOPOLOGY;

FERROELECTRIC MATERIALS;

EID: 84863116370     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.108.077203     Document Type: Article

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