SCOPUS 정보 검색 플랫폼

Volumn 12, Issue 14, 2012, Pages 2568-2574

A facile route for the fabrication of large-scale gate-all-around nanofluidic field-effect transistors with low leakage current

(5) Shin, Sangwoo a Kim, Beom Seok a Song, Jiwoon a Lee, Hwanseong a Cho, Hyung Hee a

a Yonsei University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM OXIDE;

ARTICLE; BIOTECHNOLOGY; CHANNEL GATING; DESALINATION; DNA SEQUENCE; DRUG DELIVERY SYSTEM; ELECTRIC CURRENT; ELECTRIC FIELD; ELECTRODE; ENERGY CONSERVATION; FIELD EFFECT TRANSISTOR; NANOFABRICATION; NANOFLUIDICS; NANOTECHNOLOGY; PRIORITY JOURNAL;

EID: 84862874772 PISSN: 14730197 EISSN: 14730189 Source Type: Journal
DOI: 10.1039/c2lc40112f Document Type: Article

Times cited : (17)

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