Influence of sputtering power on composition, structure and electrical properties of RF sputtered CuIn 1-x Ga x Se 2 thin films

Applied Surface Science

Volumn 258, Issue 13, 2012, Pages 5222-5229

  Yu, Zhou ^a   Yan, Chuanpeng ^a   Huang, Tao ^a   Huang, Wen ^a   Yan, Yong ^a   Zhang, Yanxia ^a   Liu, Lian ^a   Zhang, Yong ^a   Zhao, Yong ^a,b  

^a SOUTHWEST JIAOTONG UNIVERSITY   (China)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

Annealing; Sputtering; Stoichiomertic composition

Indexed keywords

ANNEALING; COPPER ALLOYS; COPPER COMPOUNDS; GALLIUM ALLOYS; INDIUM ALLOYS; MAGNETRON SPUTTERING; SEMICONDUCTOR ALLOYS; SPUTTERING; STRUCTURE (COMPOSITION); TEMPERATURE;

CHALCOPYRITE STRUCTURES; ELECTRICAL CONDUCTIVITY; LOW TEMPERATURE REGIONS; NEAR STOICHIOMETRIC; RADIO FREQUENCY MAGNETRON SPUTTERING; SEMICONDUCTOR CHARACTERS; THERMOIONIC EMISSIONS; VARIABLE RANGE HOPPING;

THIN FILMS;

EID: 84862823433     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.01.152     Document Type: Article

References (29)

1. K.L. Chopra, P.D. Paulson, and V. Dutta Prog. Photovolt. Res. Appl. 12 2004 69
2. M. Powalla, G. Voorwinden, D. Hariskos, P. Jackson, and R. Kniese Thin Solid Films 517 2009 2111
3. O. Volobujeva, M. Altosaar, J. Raudoja, E. Mellikov, M. Grossberg, L. Kaupmees, and P. Barvinschi Sol. Energy Mater. Sol. Cells 93 2009 11
4. S.H. Yoon, K.W. Seo, S.S. Lee, and W. Shim Thin Solid Films 515 2006 1544
5. S.Y. Hu, W.H. Lee, S.C. Chang, Y.L. Cheng, and Y.L. Wang J. Electrochem. Soc. 158 2011 B557
6. A. Romeo, M. Terheggen, D. Abou-Ras, D.L. Batzner, F.J. Haug, M. Kalin, D. Rudmann, and A.N. Tiwari Prog. Photovolt. Res. Appl. 12 2004 93
7. I. Repins, M.A. Contreras, B. Egaas, C. DeHart, J. Scharf, and C.L. Perkins Prog. Photovolt. Res. Appl. 16 2008 235
8. N.G. Dhere, and K.W. Lynn Sol. Energy Mater. Sol. Cells 41 1996 271
9. S.D. Kim, H.J. Kim, K.H. Yoon, and J.S. Song Sol. Energy Mater. Sol. Cells 62 2000 357
10. H.K. Song, J.K. Jeong, H.J. Kim, S.K. Kim, and.K.H. Yoon Thin Solid Films 435 2003 186
11. F. Jiang, and J. Feng Thin Solid Films 515 2006 1950
12. S.B. Zhang, S.-H. Wei, A. Zunger, and H. Katayama-Yoshida Phys. Rev. B 57 1998 9642
13. J. Muller, J. Nowoczin, and H. Schmitt Thin Solid Films 496 2006 364
14. Y.C. Lin, J.H. Ke, W.T. Yen, S.C. Liang, C.H. Wu, and C.T. Chiang Appl. Surf. Sci. 257 2011 4278
15. J.H. Shi, Z.Q. Li, D.W. Zhang, Q.Q. Liu, Z. Sun, and S.M. Huang Prog. Photovolt. Res. Appl. 19 2010 160
16. P. Jackson, R. Wurz, U. Rau, J. Mattheis, M. Kurth, T. Schlotzer, G. Bilger, and J.H. Werner Prog. Photovolt. Res. Appl. 15 2007 507
17. T. Nakada, and A. Kunioka Jpn. J. Appl. Phys. 37 1998 L1065
18. Y. Oda, M. Matsubayashi, T. Minemoto, and H. Takakura J. Cryst. Growth 311 2009 738
19. A.M. Fernandez, and R.N. Bhattacharya Thin Solid Films 474 2005 10
20. C. Amory, J.C. Berne'de, E. Halgand, and S. Marsillac Thin Solid Films 431 2003 22
21. W. Liu, J.G. Tian, Q. He, F.Y. Li, C.J. Li, and Y. Sun Thin Solid Films 519 2010 244
22. J.Y.W. Seto J. Appl. Phys. D 46 1975 5224
23. N.F. Mott Philos. Mag. 19 1969 835
24. D. Lemoine, and J. Mendolia Phys. Lett. A 82 1981 418
25. G.W. El Haj Moussa, Ariswan, A. Khoury, F. Guastavino, and C. Llinares Solid State Commun. 122 2002 195
26. A. Amara, A. Ferdi, A. Drici, J.C. Berne'de, M. Morsli, and M. Guerioune Catal. Today 113 2006 251
27. P. Sigmund Phys. Rev. 184 1969 383
28. M.P. Seah, C.A. Clifford, F.M. Green, and I.S. Gilmore Surf. Interface Anal. 37 2005 444
29. W.D. Wilson, L.G. Haggmark, and I.P. Biersack Phys. Rev. B 15 1977 2458