CVD nanocrystalline diamond coatings on Ti alloy: A synchrotron-assisted interfacial investigation

Materials Chemistry and Physics

Volumn 134, Issue 1, 2012, Pages 145-152

  Li, Y S ^a   Zhang, C Z ^a   Ma, H T ^b   Yang, L Z ^a   Zhang, L L ^a   Tang, Y ^a   Li, X J ^c   He, L L ^c   Feng, R ^d   Yang, Q ^a   Hirose, A ^a  

^a UNIVERSITY OF SASKATCHEWAN   (Canada)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^c INSTITUTE OF METAL RESEARCH   (China)

^d CANADIAN LIGHT SOURCE INC   (Canada)

Author keywords

Chemical vapor deposition; Diamond coating; Interfaces; Ti alloy

Indexed keywords

ADHESION BEHAVIORS; ALLOY SUBSTRATES; DEPOSITION TEMPERATURES; DIAMOND COATING; INDENTATION TEST; INTERFACIAL STRUCTURES; INTERMEDIATE LAYERS; LOW DEPOSITION TEMPERATURE; METHANE CONCENTRATIONS; MICRO-STRUCTURAL; MICROWAVE PLASMA-ENHANCED CVD; NANOCRYSTALLINE DIAMOND COATINGS; NUCLEATION DENSITIES; NUCLEATION RATE; SUBSTRATE DAMAGE; TI ALLOYS; TI-6AL-4V ALLOY; XRD;

ADHESION; BOND STRENGTH (MATERIALS); CHEMICAL VAPOR DEPOSITION; COATINGS; DIAMOND CUTTING TOOLS; INTERFACES (MATERIALS); METHANATION; NUCLEATION; PLASMA CVD; SYNCHROTRON RADIATION; TITANIUM ALLOYS; TITANIUM CARBIDE;

SUBSTRATES;

EID: 84862820119     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.02.043     Document Type: Article

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