Residual stresses and debonding of diamond films on titanium alloy substrates

Diamond and Related Materials

Volumn 5, Issue 6-8, 1996, Pages 674-681

  Chandra, L ^a   Chhowalla, M ^a   Amaratunga, G A J ^a   Clyne, T W ^a  

^a Dept of Mat Science and Metallurgy ^*  (United Kingdom)

Author keywords

Debonding; Residual stress; Titanium alloy substrates

Indexed keywords

EID: 0001136633     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00431-9     Document Type: Article

References (28)

1. D.W. Hoffman, Stresses in thin films: the relevance of grain boundaries and impurities, Thin Solid Films, 34 (1976) 185-190.
2. D.W. Hoffmann, Film stress diagnostic in the sputter deposition of metals, in Proc. 7th ICVM, Iron & Steel Inst., Japan, 1982, pp. 145-157.
3. J.A. Thornton and D.W. Hoffman, Stress-related effects in thin films, Thin Solid Films, 171 (1989) 5-31.
4. E.D. Specht, R.E. Clausing and L. Heartherly, Measurement of crystalline strain and orientation in diamond films grown by chemical vapour deposition, J. Mater. Res., 5 (1990) 2351-2355.
5. J.A. Baglio, B.C. Farnsworth, S. Hankin, G. Hamill and D. O'Neil, Studies of stress-related issues in microwave CVD diamond on 〈100〉 silicon substrates, Thin Solid Films, 212 (1992) 180-185.
6. H. Guo and M. Alam, Strain in CVD diamond films: effects of deposition variables, Thin Solid Films, 212 (1992) 173-179.
7. P.R. Chalker, A.M. Jones, C. Johnston and I.M. Buckley-Golder, Evaluation of internal stresses present in chemical vapor deposition diamond films, Surf. Coat. Technol., 47 (1991) 365-374.
8. M. Yoshikawa, G. Katagiri, H. Ishida, A. Ishitani, M. Ono and K. Matsumura, Characterisation of crystalline quality of diamond films by Raman spectroscopy, Appl. Phys. Lett., 55 (1989) 2608-2610.
9. W. Wanlu, L. Kejun, G. Jinying and L. Aimin, Internal stress analysis in diamond films formed by DC plasma chemical vapour deposition, Thin Solid Films, 215 (1992) 174-178.
10. D. Schwarzbach, R. Haubner and B. Lux, Internal stresses in CVD diamond layers, Diamond Relat. Mater., 3 (1994) 757-764.
11. L. Shafer and C.P. Klages, Growth and properties of diamond films prepared by microwave plasma chemical vapour deposition using different oxygen-containing source gases, Surf. Coat. Technol., 47 (1991) 13-21.
12. H. Windischman, G.F. Epps, Y. Chong and R.W. Collins, Intrinsic stress in diamond films prepared by microwave plasma CVD, J. Appl. Phys., 68 (1991) 2231-2237.
13. S.J. Howard, Y.C. Tsui and T.W. Clyne, The effect of residual stresses on the debonding of coatings. Part I: A model for delamination at a bimaterial interface, Acta Metall Mater., 42 (1994) 2823-2836.
14. R.C. McCune, D.W. Hoffman, T.J. Whalen and C.O. McHugh, Adherence of diamond films produced by microwave plasma deposition on Sialon Tool Inserts., in Thin Films: Stresses and Mechanical Properties, Mater. Res. Soc., (1989) 261-266.
15. H.C. Shih, C.P. Sung, Y.S. Tang and Y.S. Chen, Microstructure and characterization of diamond film growth on various substrates, Surf. Coat. Technol., 52 (1992) 105-114.
16. C.P. Sung and H.C. Shih, The interfacial structure and composition of diamond films grown on various substrates, J. Mater. Res., 7 (1992) 105-116.
17. P. Bou, L. Vandenbulcke, R. Herbin and F. Hillion, Diamond film nucleation and interface characterization, J. Mater. Res., 7 (1992) 2151-2159.
18. K. Kurihara, K. Sasaki and M. Kawarada, Adhesion improvement of diamond films, in M. Yamanouchi, M. Koizumi, T. Hirai and I. Shiota (eds.), The first International Symposium on FGM, Soc. of Non-Traditional Technology, Tokyo, Japan, 1990, pp. 65-69.
19. K. Kurihara, K. Sasaki, M. Kawarada and Y. Goto, Formation of functionally gradient diamond films, Thin Solid Films, 212 (1992) 164-168.
20. J. Koskinen, J.P. Hirvonen, S.P. Hannula, K. Pischow, H. Kattelus and I. Suni, Nanolayered gradient structures as an intermediate layer for diamond coatings, Diamond Relat. Mater., 3 (1994) 1107-1111.
21. J.W. Hutchinson and Z. Suo, Mixed mode cracking in layered materials, Adv. Appl. Mech., 29 (1991) 63-191.
22. S.C. Gill and T.W. Clyne, Investigation of residual stress generation during thermal spraying by continuous curvature measurement, Thin Solid Films, 250 (1994) 172-180.
23. G.G. Stoney, The tension of metallic films deposited by electrolysis, Proc. R. Soc. London, A82 (1909) 172-175.
24. R.E. Bolz and G.L. Tuve (eds.), Handbook of Tables for Applied Engineering Science, Vol. 57, CRC Press, Cleveland, 1973.
25. I.E. Field, Appendix, The Properties of Natural and Synthetic Diamond, Academic Press, London, 1992, pp. 668-699.
26. Y.C. Tsui, S.J. Howard and T.W. Clyne, Application of a model for the effect of residual stresses on debonding of coatings under applied loads, in P. Vincenzini (ed.), Advances in Inorganic Films and Coatings, Techna Srl., 1995, pp. 19-26.
27. J.W. Ager and M.D. Drory, Quantitative measurement of residual stress by Raman spectroscopy in diamond grown on a Ti alloy by chemical vapour deposition, Phys. Rev. B, 48 (1993) 2601-2607.
28. A.G. Evans, M.D. Drory and M.S. Wu, The cracking and decohesion of thin films, J. Mater. Res., 3 (1988) 1043-1049.