|
Volumn 256, Issue 24, 2010, Pages 7653-7657
|
Growth and adhesion failure of diamond thin films deposited on stainless steel with ultra-thin dual metal interlayers
|
Author keywords
Adhesion; Chemical vapor deposition; Diamond thin film; Steel; Ultra thin interlayer
|
Indexed keywords
ADHESION;
ALUMINUM COMPOUNDS;
BINARY ALLOYS;
CARBIDES;
CHEMICAL VAPOR DEPOSITION;
COMPOSITE FILMS;
DIAMONDS;
ION BEAMS;
IRON COMPOUNDS;
PLASMA CVD;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SPUTTERING;
STAINLESS STEEL;
STEEL;
ADHESION FAILURES;
DIAMOND THIN FILM;
ION BEAM SPUTTERING DEPOSITION;
METAL INTERLAYERS;
MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS;
NUCLEATION AND GROWTH;
STAINLESS STEEL SUBSTRATES;
ULTRA-THIN;
THIN FILMS;
|
EID: 77955426006
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2010.06.022 Document Type: Article |
Times cited : (40)
|
References (27)
|