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Volumn 38, Issue 6, 2012, Pages 1261-1277

Ion engineering techniques for the preparation of the highly effective TiO 2 photocatalysts operating under visible light irradiation

(3) Takeuchi, Masato a Matsuoka, Masaya a Anpo, Masakazu a

a Osaka Prefecture University (Japan)

Author keywords

Ion engineering techniques; Metal ion implantation method; Photocatalyst; RF magnetron sputtering deposition method; Visible light

Indexed keywords

ATOMIC LEVELS; DEGRADATION OF ORGANIC COMPOUNDS; DEPOSITION METHODS; ENGINEERING TECHNIQUES; FIELD TEST; ION IMPLANTED; METAL-ION-IMPLANTATION METHOD; PHOTOCATALYTIC REACTIVITY; RF-MAGNETRON SPUTTERING; SINGLE PROCESS; SOLAR LIGHT IRRADIATION; THIN FILM PHOTOCATALYST; TIO; VISIBLE LIGHT; VISIBLE-LIGHT IRRADIATION; VISIBLE-LIGHT RESPONSIVE TIO;

CHROMIUM; DEGRADATION; DEPOSITION; ION IMPLANTATION; IRRADIATION; MAGNETRON SPUTTERING; METAL IONS; PHOTOCATALYSTS; THIN FILMS; VAPOR DEPOSITION;

TITANIUM DIOXIDE;

EID: 84862767692 PISSN: 09226168 EISSN: 15685675 Source Type: Journal
DOI: 10.1007/s11164-011-0465-x Document Type: Conference Paper

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