Preparation of Ti-Si binary oxide thin film photocatalysts by the application of an ionized cluster beam method

Journal of Synchrotron Radiation

Volumn 8, Issue 2, 2001, Pages 643-644

  Takeuchi, Masato ^a   Matsuoka, Masaya ^a   Yamashita, Hiromi ^a   Anpo, Masakazu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Ionized Cluster Beam method; Photocatalysts; Ti Si binary oxide thin film

Indexed keywords

ARTICLE;

EID: 0035289041     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049500012656     Document Type: Article

References (7)

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5. Takeuchi, M., Yamashita, H., Matsuoka, M., Anpo, M., Hirao, T., Itoh, N. & Iwamoto, N. (2000) Cat. Lett. 66, 185-187.
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