Photocatalytic decomposition of NO under visible light irradiation on the Cr-ion-implanted TiO2 thin film photocatalyst

Catalysis Letters

Volumn 67, Issue 2-4, 2000, Pages 135-137

  Takeuchi, Masato ^a   Yamashita, Hiromi ^a   Matsuoka, Masaya ^a   Anpo, Masakazu ^a   Hirao, Takashi ^b   Itoh, Nobuhisa ^c   Iwamoto, Nobuya ^d  

^a Osaka Prefecture University   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c PANASONIC CORPORATION   (Japan)

^d Ion Eng Res Institute Corporation   (Japan)

Author keywords

Decomposition reaction of NO; Ion implantation; Ionized cluster beam deposition method; TiO2 thin film photocatalyst; Visible light

Indexed keywords

EID: 0041708490     PISSN: 1011372X     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1019065521567     Document Type: Article

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