Extending the photoresponse of TiO2 to the visible light region: Photoelectrochemical behavior of TiO2 thin films prepared by the radio frequency magnetron sputtering deposition method

Journal of Physical Chemistry B

Volumn 110, Issue 11, 2006, Pages 5537-5541

  Kikuchi, Hisashi ^a,b   Kitano, Masaaki ^b   Takeuchi, Masato ^b   Matsuoka, Masaya ^b   Anpo, Masakazu ^b   Kamat, Prashant V ^a  

^a UNIVERSITY OF NOTRE DAME   (United States)

^b Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ELECTROCHEMISTRY; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SEMICONDUCTOR MATERIALS; TEMPERATURE CONTROL; THIN FILMS;

PHOTOELECTROCHEMICAL RESPONSE; POWER CONVERSION; RADIO FREQUENCY MAGNETRON SPUTTERING (RF-MS) DEPOSITION;

TITANIUM DIOXIDE;

EID: 33645653975     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp058262g     Document Type: Article

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