The effect of deposition parameters and post treatment on the electrical properties of Mo thin films

Thin Solid Films

Volumn 520, Issue 18, 2012, Pages 5936-5939

  Su, Cherng Yuh ^a   Liao, Kuang Hsiang ^a   Pan, Cheng Tang ^b   Peng, Pei Wen ^c  

^a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c TAIPEI MEDICAL UNIVERSITY   (Taiwan)

Author keywords

Annealing temperature; Molybdenum; Sheet resistance; Solar cell back contact; Sputtering power; Working distance; X ray diffraction

Indexed keywords

ADHESIVITY; ANNEALING TEMPERATURES; BACK CONTACT; CU(IN , GA)SE; DC MAGNETRON SPUTTERING SYSTEMS; DEPOSITION PARAMETERS; POST TREATMENT; SODA LIME GLASS SUBSTRATE; SPUTTERING POWER; WORKING DISTANCES;

ADHESION; ANNEALING; DEPOSITION; ELECTRIC PROPERTIES; MOLYBDENUM; SEMICONDUCTING SELENIUM COMPOUNDS; SHEET RESISTANCE; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

VAPOR DEPOSITION;

EID: 84862158370     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.05.027     Document Type: Article

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