High Q single crystal silicon micromechanical resonators with hybrid etching process

IEEE Sensors Journal

Volumn 12, Issue 7, 2012, Pages 2414-2415

  Wu, Guoqiang ^a,b   Xu, Dehui ^b   Xiong, Bin ^b   Wang, Yuelin ^b  

^a UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Dry release fabrication; hybrid etching; micromechanical resonators; pre etched cavity

Indexed keywords

ETCHING PROCESS; HYBRID SILICON; MODE RESONATORS; PRE-ETCHED CAVITY; PRE-ETCHING; QUALITY FACTORS; RESONATOR STRUCTURES; SINGLE CRYSTAL SILICON; SQUARE PLATES;

ANISOTROPY; DRY ETCHING; FABRICATION; MICROMECHANICAL RESONATORS; MONOCRYSTALLINE SILICON; RESONATORS; SILICON WAFERS; SINGLE CRYSTALS; WET ETCHING;

ANISOTROPIC ETCHING;

EID: 84861899267     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2012.2191772     Document Type: Article

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