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Journal of Materials Science: Materials in Electronics

Volumn 23, Issue 4, 2012, Pages 889-896

Induced NH 2 bonding of carbon nanotubes using NH 3 plasma-enhanced chemical vapor deposition

(5) Chiou, Ai Huei a Chang, Yu Ming b Wu, Wen Fa c Chou, Chang Ping a Hsu, Chun Yao d

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b INSTITUTE OF NUCLEAR ENERGY RESEARCH (Taiwan)

c NATIONAL NANO DEVICE LABORATORIES (Taiwan)

d LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA TREATMENT; SCANNING ELECTRON MICROSCOPE;

CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; FUNCTIONAL GROUPS; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; VAPORS;

CARBON NANOTUBES;

EID: 84861849621 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-011-0514-7 Document Type: Article

Times cited : (6)

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