Electrodeposition of Copper in the Presence of Aliphatic and Aromatic Diamines as Organic Additives

Electrochemistry

Volumn 80, Issue 4, 2012, Pages 226-238

  Abdel Rahman, H H ^a   Harfoush, A A ^a   Moustafa, A H E ^a  

^a Alexandria University Faculty Of Science   (Egypt)

Author keywords

Aliphatic diamines; Aromatic diamines; Copper electrodeposition; Limiting current

Indexed keywords

ALIPHATIC DIAMINES; AROMATIC DIAMINE; COPPER ELECTRODEPOSITION; DIMENSIONLESS GROUPS; ELECTROCHEMICAL METHODS; ELECTRODEPOSITION PROCESS; LIMITING CURRENT; OBSERVATION TECHNIQUES; ORGANIC ADDITIVES; PLATING SOLUTIONS; ROTATING CYLINDER ELECTRODES; ROTATING DISK ELECTRODES; SULPHATE SOLUTIONS; THERMODYNAMIC PARAMETER;

AMINES; AROMATIC COMPOUNDS; COPPER; ROTATING DISKS; SCANNING ELECTRON MICROSCOPY;

ELECTRODEPOSITION;

EID: 84861842866     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.80.226     Document Type: Article

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