Corrosion of copper in presence of acetic acid derivatives

Journal of Dispersion Science and Technology

Volumn 31, Issue 12, 2010, Pages 1740-1751

  Abdel Rahman, H H ^a  

^a Alexandria University Faculty Of Science   (Egypt)

Author keywords

Acetic acid derivatives; Corrosion inhibition; Electrodeposition; Limiting current

Indexed keywords

ACID DERIVATIVE; COPPER SURFACE; CORROSION INHIBITION; CORROSION PROCESS; DIFFUSION CONTROLLED; DIMENSIONAL ANALYSIS METHODS; ELECTRODE HEIGHT; ELECTRODE SURFACES; FIXED TEMPERATURE; FLORY-HUGGINS; FREE ENERGY OF ADSORPTION; INHIBITION EFFICIENCY; LANGMUIRS; LIMITING CURRENT; MASS TRANSFER CORRELATION; PROTECTIVE FILMS; RATE OF CORROSIONS; ROTATING CYLINDERS; SCANNING ELECTRON MICROSCOPES; SEM; SPONTANEOUS ADSORPTION;

ACETIC ACID; ACTIVATION ENERGY; ADSORPTION; COPPER; COPPER CORROSION; CORROSION PREVENTION; ELECTRODEPOSITION; MASS TRANSFER; METAL ANALYSIS; SCANNING ELECTRON MICROSCOPY;

PH EFFECTS;

EID: 78649346151     PISSN: 01932691     EISSN: 15322351     Source Type: Journal    
DOI: 10.1080/01932690903543147     Document Type: Article

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