Evaluation of methods for determining food surface temperature in the presence of low-pressure cool plasma

Innovative Food Science and Emerging Technologies

Volumn 15, Issue , 2012, Pages 23-30

  Knoerzer, Kai ^a   Murphy, Anthony B ^a   Fresewinkel, Mark ^a   Sanguansri, Peerasak ^a   Coventry, John ^b  

^a CSIRO   (Australia)

^b UNIVERSITY OF MELBOURNE   (Australia)

Author keywords

Cool plasma; Low pressure; Microwave; Temperature measurement; Vacuum

Indexed keywords

COLOR CHANGING; EFFECTIVE TEMPERATURE; EQUIPMENT MANUFACTURERS; EVALUATION OF METHODS; EXCITED MOLECULES; FAST RESPONSE TIME; FIBEROPTIC PROBES; FOOD SURFACES; FRESH PRODUCE; HARSH ENVIRONMENT; HEAT PROCESSING; LOW PRESSURES; LOW TEMPERATURES; MEASUREMENT TECHNIQUES; PLASMA CONDITIONS; PLASMA ENVIRONMENTS; PLASMA PROCESS; PLASMA TECHNOLOGY; PLASMA TREATMENT; PROCESS VALIDATION; PRODUCT SURFACE; REACTIVE SPECIES; RESISTANCE THERMOMETERS; SURFACE TEMPERATURE MEASUREMENT; TEMPERATURE INDICATORS; TEMPERATURE MEASUREMENT SYSTEMS; TEMPERATURE SENSING;

ATMOSPHERIC TEMPERATURE; DECONTAMINATION; ELECTROMAGNETIC FIELDS; FIBER OPTICS; FOOD PRODUCTS; INDUSTRY; MICROWAVES; PLASMA APPLICATIONS; PLASMAS; PROBES; PROCESS CONTROL; REFLECTIVE COATINGS; SURFACE PROPERTIES; SURFACES; TECHNOLOGY; THERMOCOUPLES; VACUUM;

TEMPERATURE MEASUREMENT;

EID: 84861823877     PISSN: 14668564     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ifset.2012.02.008     Document Type: Article

References (42)

1. D. Daineka, V. Suendo, and P. Roca i Cabarrocas Temperature dependence of the optical functions of amorphous silicon-based materials: Application to in situ temperature measurements by spectroscopic ellipsometry Thin Solid Films 468 1-2 2004 298 302
2. J.F. Daviet, L. Peccoud, and F. Mondon Heat-transfer in a microelectronics plasma reactor Journal of Applied Physics 73 3 1993 1471 1479
3. B. Eliasson, and U. Kogelschatz Nonequilibrium volume plasma chemical processing IEEE Transactions on Plasma Science 19 6 1991 1063 1077
4. J. Feichtinger Sterilisation with low-pressure microwave plasmas Proc. 8th International Conference on Plasma Surface Engineering 2002 Elsevier Science Garmisch Partenkirchen, Germany
5. R.B. Gadri Sterilization and plasma processing of room temperature surfaces with a one atmosphere uniform glow discharge plasma (OAUGDP) Surface and Coatings Technology 131 1-3 2000 528 541
6. C.C. Hsu, M.J. Titus, and D.B. Graves Measurement and modeling of time- and spatial-resolved wafer surface temperature in inductively coupled plasmas Journal of Vacuum Science and Technology A 25 3 2007 607 614
7. I. Hussla, K. Enke, H. Grünwald, G. Lorenz, and H. Stoll In situ silicon-wafer temperature measurements during RF argon-ion plasma etching via fluoroptic thermometry Journal of Physics D: Applied Physics 20 7 1987 889 896 (Pubitemid 17638642)
8. C. Jiang, P.T. Vernier, M.T. Chen, Y.H. Wu, L.L. Wang, and M.A. Gunderson Low energy nanosecond pulsed plasma sterilization for endodontic applications Proc. 2008 IEEE International Power Modulators and High Voltage Conference 2008 IEEE Las Vegas, NV, USA 77 79
9. In Proc. Symposium on Surface Engineering in Materials Science III held at the 2005 TMS Annual Meeting. San Francisco, CA, USA: Minerals, Metals & Materials Soc.
10. J.H. Kim, Y.H. Kim, Y.H. Choi, W. Choe, J.J. Choi, and Y.S. Hwang Optical measurements of gas temperatures in atmospheric pressure RF cold plasmas Surface and Coatings Technology 171 1-3 2003 211 215 (Pubitemid 36689515)
11. K. Knoerzer, M. Regier, U. Erle, and H. Schubert Development of a model food for microwave processing and the prediction of its physical properties The Journal of Microwave Power and Electromagnetic Energy 39 3 + 4 2004 167 177 (Pubitemid 43014028)
12. K. Knoerzer, M. Regier, and H. Schubert Measuring temperature distributions during microwave processing H. Schubert, M. Regier, The microwave processing of foods 2005 Woodhead Publishing Cambridge, UK 243 263
13. H.C. Langowski, and P.M.J. Wunderlich Plasmatechnologie - Neue Wege zur Entkeimung von Packstoffmaterialien Chemie Ingenieur Technik 78 11 2006 1697 1706
14. M. Laroussi Low temperature plasma-based sterilization: Overview and state-of-the-art Plasma Processes and Polymers 2 5 2005 391 400 (Pubitemid 41064407)
15. S. Lerouge Sterilization by low-pressure plasma: The role of vacuum-ultraviolet radiation Plasmas and Polymers 5 1 2000 31 46 (Pubitemid 32067445)
16. S. Lerouge Effect of gas composition on spore mortality and etching during low-pressure plasma sterilization Journal of Biomedical Materials Research 51 1 2000 128 135 (Pubitemid 30331991)
17. W.D. Lichtenbelt Evaluation of wireless determination of skin temperature using iButtons Physiology and Behavior 88 4-5 2006 489 497 (Pubitemid 44093616)
18. T. Matsunaga, K. Hieda, and O. Nikaido Wavelength dependent formations of Thymine dimers and (4-6) photoproducts in DNA by monochromatic ultraviolet-light ranging from 150 to 365 nm Photochemistry and Photobiology 54 3 1991 403 410
19. Maxim Integrated Products Inc. Temperature Logger iButton DS1922T URL http://www.maxim-ic.com/quick-view2.cfm/qv-pk/4088 2009
20. P. Messerer Plasma sterilisation and surface modification of thermolabile materials Proc. Symposium on Surface Engineering in Materials Science III held at the 2005 TMS Annual Meeting 2005 Minerals, Metals & Materials Soc San Francisco, CA, USA
21. M. Moisan Low-temperature sterilization using gas plasmas: A review of the experiments and an analysis of the inactivation mechanisms International Journal of Pharmaceutics 226 1-2 2001 1 21 (Pubitemid 32800778)
22. M. Moisan Plasma sterilization: Methods and mechanisms Proc. 15th International Symposium on Plasma Chemistry 2001 International Union Pure & Applied Chemistry Orleans, France 495 496
23. S. Moreau Using the flowing afterglow of a plasma to inactivate Bacillus subtilis spores: Influence of the operating conditions Journal of Applied Physics 88 2 2000 1166 1174
24. P.W. Morrison, and J.R. Haigis In situ infrared measurements of film and gas properties during the plasma deposition of amorphous hydrogenated silicon Journal of Vacuum Science and Technology A 11 3 1993 490 502
25. National Physical Laboratory What is a platinum resistance thermometer? URL http://www.npl.co.uk/server.php?show=ConWebDoc.2141 2009
26. B.A. Niemira, and J. Sites Cold plasma inactivates Salmonella Stanley and Escherichia coli O157:H7 inoculated on Golden Delicious apples Journal of Food Protection 71 7 2008 1357 1365 (Pubitemid 351961725)
27. Omega Engineering URL http://www.omega.com/techref/themointro.html 2009
28. P.D. Parry Target heating during ion implantations Journal of Vacuum Science and Technology 13 2 1976 622 629
29. 2 mixtures IEEE Transactions on Plasma Science 30 4 2002 1429 1436
30. D. Purevdorj Inactivation of Escherichia coli by microwave induced low temperature argon plasma treatments Journal of Food Engineering 53 4 2002 341 346 (Pubitemid 34524741)
31. V. Rat, A.B. Murphy, J. Aubreton, M.-F. Elchinger, and P. Fauchais Treatment of non-equilibrium phenomena in thermal plasma flows Journal of Physics D: Applied Physics 41 18 2008 183001
32. K. Richter, and K. Drescher Pyrometric substrate temperature measurement during plasma etching Surface and Coatings Technology 74-75 1 1995 546 551
33. P. Sanguansri, K. Knoerzer, J. Coventry, and C. Versteeg Progress and issues with the commercialization of cool plasma in food processing: A selection of case studies C.J. Doona, K. Kustin, F.E. Feeherry, Case studies in novel food processing technologies: Innovations in processing, packaging, and predictive modelling 2010 Woodhead Publishing Cambridge, UK
34. A. Schuetze The atmospheric-pressure plasma jet: A review and comparison to other plasma sources IEEE Transactions on Plasma Science 26 6 1998 1685 1694
35. L. Sirghi, G. Popa, and Y. Hatanaka Heating of polymer substrate by discharge plasma in radiofrequency magnetron sputtering deposition Thin Solid Films 515 4 2006 1334 1339 (Pubitemid 44716031)
36. M.D. Smith Plasma technology Kirk-Othmer encyclopedia of chemical technology (online) 2000 Wiley New York, USA
37. V.M. Steelman Ethylene oxide: The importance of aeration AORN Journal 55 3 1992 773 787
38. N. Tran, M. Amidi, and P. Sanguansri Cool plasma for large scale chemical-free microbial inactivation of surfaces Food Australia 60 8 2008 344 347
39. M. Ulrickson Surface thermography Journal of Vacuum Science and Technology A 4 3 1986 1805 1809
40. S.V. Vettoor Electrical conduction and superconductivity Resonance 8 9 2003 41 48
41. M. Vleugels, G. Sharma, X.T. Deng, E. Greenacre, T. Brocklehurst, and M.G. Kong Atmospheric plasma inactivation of biofilm-forming bacteria for food safety control IEEE Transactions on Plasma Science 33 2 2005 824 828 (Pubitemid 40679343)
42. Y. Yamada, J. Ishii, A. Nakaoka, and Y. Mizojiri Silicon wafer surface-temperature monitoring system for plasma etching process International Journal of Thermophysics 32 7-8 2011 1457 1466