Natively textured surface aluminum-doped zinc oxide transparent conductive layers for thin film solar cells via pulsed direct-current reactive magnetron sputtering

Thin Solid Films

Volumn 520, Issue 16, 2012, Pages 5392-5399

  Chen, Xin Liang ^a   Li, Lin Na ^a   Wang, Fei ^a   Ni, Jian ^a   Geng, Xin Hua ^a   Zhang, Xiao Dan ^a   Zhao, Ying ^a  

^a NANKAI UNIVERSITY   (China)

Author keywords

Magnetron sputtering; Solar cells; Textured surface; Thin films; Transparent conductive oxides; Zinc oxide

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; DIRECT-CURRENT; GLASS SUBSTRATES; HIGH PURITY; HIGH TRANSPARENCY; IN-SITU; INDUSTRIAL PROCESSING; OXYGEN GAS FLOW; PHOTOVOLTAIC; PLASMA EMISSION MONITORING; PRODUCTION COST; REACTIVE MAGNETRON SPUTTERING; REACTIVE SPUTTERING PROCESS; SILICON THIN FILM; SOURCE MATERIAL; SUBSTRATE TEMPERATURE; TEXTURED SURFACE; THIN FILM SOLAR CELLS; TRANSPARENT CONDUCTIVE LAYER; TRANSPARENT CONDUCTIVE OXIDES; VISIBLE RANGE; ZNO; ZNO:AL THIN FILMS;

ALUMINUM; ALUMINUM COATINGS; ELECTRIC PROPERTIES; IN SITU PROCESSING; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SOLAR CELLS; SUBSTRATES; SURFACES; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

DEPOSITION;

EID: 84861724689     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.03.120     Document Type: Article

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