Deposition of large area, directly textured, ZnO:Al films by reactive-environment, hollow cathode sputtering

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2008, Pages

  Patel, A M ^a   Guo, S Y ^a   Stavrides, A P ^a   Cambridge, J A ^a   Le, L T ^a   Efstathiadis, H ^b   Haldar, P ^b   Delahoy, A E ^a  

^a EPV Solar Inc   (United States)

^b SUNY POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; DEPOSITION METHODS; HALL EFFECT MEASUREMENT; HOLLOW CATHODES; PRODUCTION PROCESS; SECOND GENERATION; TEXTURED SURFACE; TRANSPARENT CONDUCTING OXIDE;

ALUMINUM; CATHODES; DEPOSITION; ELECTRIC PROPERTIES; METALLIC FILMS;

ZINC OXIDE;

EID: 84879715820     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2008.4922812     Document Type: Conference Paper

References (8)

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8. A. E. Delahoy, L. Chen, B. Sang, S. Y. Guo, J. Cambridge, F. Ziobro, R. Govindarajan, S. Kleindienst, M. Akhtar "CIGS devices, modules, and processing using a hybrid evaporation/sputtering process", presented at European Photovoltaics Solar Energy Conference and Exhibition, Paris, 7-11 June 2004, pp. 1686-1689.