Technological merits, process complexity, and cost analysis of self-aligned multiple patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8326, Issue , 2012, Pages

  Chen, Yijian ^a   Cheng, Qi ^a   Kang, Weiling ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

Mandrel; Octuple (SAOP) patterning; Quadruple (SAQP); Self aligned double (SADP); Self aligned multiple patterning (SAMP); Sextuple (SASP); Spacer; Triple (SATP)

Indexed keywords

MANDREL; OCTUPLE (SAOP) PATTERNING; QUADRUPLE (SAQP); SELF-ALIGNED; SEXTUPLE (SASP); SPACER; TRIPLE (SATP);

COST ACCOUNTING; EXTREME ULTRAVIOLET LITHOGRAPHY;

COST BENEFIT ANALYSIS;

EID: 84861499903     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916490     Document Type: Conference Paper

References (7)

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2. Y. Chen, P. Xu, Y. M. Chen, L. Miao, X. Xu, C. Bencher, C. Ngai, "Self-aligned triple patterning to extend optical lithography for 1x patterning," The International Symposium on Lithography Extensions, Kobe, Japan, October 20-22, 2010.
3. Y. Chen, P. Xu, L. Miao, Y. M. Chen, Xumou Xu, D. Mao, P. Blanco, C. Bencher, R. Hung, C. Ngai, "Self-aligned Triple Patterning for Continuous IC Scaling to Half-Pitch 15nm," Proc. of SPIE, Vol. 7973, 79731P, 2011.
4. P. Xu, Y. M. Chen, Y. Chen, L. Miao, S. Sun, S-W Kim, A. Berger, D. Mao, C. Bencher, R. Hung, C. Ngai, "Sidewall spacer quadruple patterning for 15-nm half-pitch," Proc. of SPIE, Vol. 7973, 79731Q, 2011.
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6. Y. Chen, Q. Cheng, W. Kang, "Mandrel and spacer engineering based self-aligned triple patterning," SPIE Advanced Lithography, 2012.
7. C. Bencher, Y. M. Chen, H. Dai, W. Montgomery, L. Huli, "22nm Half-Pitch Patterning by CVD Spacer Self Alignment Double Patterning (SADP)", Proc. SPIE Vol. 6924, 69244E, 2008.