Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7973, Issue , 2011, Pages

  Chen, Yijian ^a   Xu, Ping ^a   Miao, Liyan ^a   Chen, Yongmei ^a   Xu, Xumou ^a   Mao, Daxin ^a   Blanco, Pokhui ^a   Bencher, Chris ^a   Hung, Raymond ^a   Ngai, Chris S ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

LER; Mandrel core; Satp mandrel recession (SMR); Self aligned quadruple patterning (SAQP); Self aligned triple patterning (SATP); Spacer

Indexed keywords

LER; MANDREL/CORE; SATP MANDREL RECESSION (SMR); SELF-ALIGNED; SPACER;

LITHOGRAPHY;

ROUGHNESS MEASUREMENT;

EID: 79959236953     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881645     Document Type: Conference Paper

References (5)

1. M. Dusa, J. Quaedackers, O. F. A. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. I. Schenau, J. Finders, B. Vleeming, G. Storms, P. Jaenen, S. Cheng, M. Maenhoudt, "Pitch doubling through dual patterning lithography challenges in integration and litho budgets, " Proc. of SPIE, vol. 6520, 65200G, 2007.
2. Y. Chen, X, Xu, Y. M. Chen, L. Miao, "Self-aligned frequency tripling technology: cost-effective 20nm line/space (half pitch) patterning using 193nm dry lithography, " Applied Materials ET Conference, June, 2009.
3. Y. Chen, P. Xu, Y. M. Chen, L. Miao, X. Xu, C. Bencher, C. Ngai, "Self-aligned triple patterning to extend optical lithography for 1× patterning, " The International Symposium on Lithography Extensions, Kobe, Japan, October 20-22, 2010.
4. C. Bencher, Y. M. Chen, H. Dai, W. Montgomery, L. Huli, "22nm Half-Pitch Patterning by CVD Spacer Self Alignment Double Patterning (SADP)", Proc. SPIE Vol. 6924, 69244E, 2008.
5. P. Xu, Y. M. Chen, Y. Chen, L. Miao, S. Sun, S-W Kim, A. Berger, D. Mao, C. Bencher, R. Hung, C. Ngai, "Sidewall spacer quadruple patterning for sub-16nm half-pitch, " SPIE Advanced Lithography, 2011.