Mandrel based patterning: Density multiplication techniques for 15nm nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7973, Issue , 2011, Pages

  Bencher, Chris ^a   Dai, Huixiong ^a   Miao, Liyan ^a   Chen, Yongmei ^a   Xu, Ping ^a   Chen, Yijian ^a   Oemardani, Shiany ^a   Sweis, Jason ^b   Wiaux, Vincent ^c   Hermans, Jan ^c   Chang, Li Wen ^d   Bao, Xinyu ^d   Yi, He ^d   Wong, H S Philip ^d  

^a APPLIED MATERIALS INC   (United States)

^b CADENCE DESIGN SYSTEMS   (United States)

^c IMEC   (Belgium)

^d Stanford University   (United States)

Author keywords

15nm; BEOL routing; Directed self assembly; DSA; EUV; Lithography; Mandrel; Patterning; PS b PMMA; Quadruple patterning; SADP; Self aligned double patterning; Sidewall spacer; Stencil; Triple patterning

Indexed keywords

15NM; BEOL ROUTING; DIRECTED SELF-ASSEMBLY; DSA; EUV; MANDREL; PATTERNING; PS-B-PMMA; QUADRUPLE PATTERNING; SADP; SELF-ALIGNED; SIDEWALL SPACER; STENCIL; TRIPLE PATTERNING;

LOGIC DESIGN; NANOTECHNOLOGY; SELF ASSEMBLY;

LITHOGRAPHY;

EID: 79959187556     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881679     Document Type: Conference Paper

References (7)

1. Dick James, from presentation "Innovations 2008", p35, courtesy of Chipworks, www.Chipworks.com.
2. Ping Xu, et al, "Sidewall Spacer Quadruple Patterning for 15nm half-pitch", SPIE Optical Microlithography XXIV, Proceedings of SPIE 7973-61, 2011.
3. Yijian Chen, et al, "Self-Aligned Triple Patterning for Continuous IC scaling to half-pitch 15nm", SPIE Optical Microlithography XXIV, Proceedings of SPIE 7973-60, 2011.
4. Xinyu Bao, et al, "Flexible Control of Block Copolymer Self-assembly using Small Topographical Templates for Future Device Fabrication", submitted to Nature Nanotechnology.
5. Joy Cheng, et al, "Directed Self-Assembly for Via Patterning", as presented at SPIE Optical Microlithography XXIV, [7637-18], unpublished manuscript. US patent application: US20100294740A1: Directed self-assembly of block copolymers using segmented pre-patterns.
6. Li-Wen Chang, Xinyu Bao, Chris Bencher, H.-S. P. Wong, "Experimental Demonstration of Aperiodic Patterns of Directed Self-Assembly by Block Copolymer Lithography for Random Logic Circuit Layout, " IEEE International Electron Devices Meeting (IEDM), paper 33.2, December 6 - 8, San Francisco, 2010.
7. He Yi, PhD student results currently unpublished, Department of Electrical Engineering, Stanford University, Stanford, CA 94305, USA.