Improvement of fabrication precision of focused ion beam by introducing simultaneous electron beam

Progress in Natural Science: Materials International

Volumn 20, Issue 1, 2010, Pages 111-115

  Luo, Hu ^a   Jing, Ran ^a   Cui, Yi Min ^a   Wang, H Ai Long ^a   Wang, Rong Ming ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

Coulomb interaction; Fabrication line width; Numerical simulation; Simultaneous electron beam

Indexed keywords

COULOMB INTERACTIONS; ELECTRON BEAMS; ELECTRONS; FABRICATION; FOCUSED ION BEAMS; IONS; MILLING (MACHINING); NUMERICAL MODELS;

DUAL-BEAM SYSTEM; ELECTRON-BEAM; FABRICATION LINE WIDTH; FABRICATION LINES; FOCUSED IONS BEAMS; ION MILLING; LINE-WIDTH; MILLING PROCESS; SCANNING ELECTRONS; SIMULTANEOUS ELECTRON BEAM;

SCANNING ELECTRON MICROSCOPY;

EID: 84861429395     PISSN: 10020071     EISSN: None     Source Type: Journal    
DOI: 10.1016/s1002-0071(12)60015-x     Document Type: Article

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