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Volumn 717-720, Issue , 2012, Pages 1283-1286
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Fabrication of silicon carbide thin film as a stabilizing layer for improving the stability of porous silicon photodiodes
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Author keywords
Porous silicon; Silicon carbide; Stabilization of photodiodes; Thermal carbonization
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Indexed keywords
ACETYLENE;
CARBONIZATION;
CRYSTALLITE SIZE;
ELECTROCHEMICAL ETCHING;
FABRICATION;
FILM PREPARATION;
FLOW OF GASES;
HYDROGEN BONDS;
LIGHTING;
PHOTODIODES;
SEMICONDUCTOR LASERS;
SILICON CARBIDE;
THERMAL CONDUCTIVITY;
THIN FILMS;
WIDE BAND GAP SEMICONDUCTORS;
HYDROGEN TERMINATION;
METAL-SEMICONDUCTOR-METAL PHOTODIODES;
POROUS SILICON LAYERS;
PULSED ELECTROCHEMICAL ETCHINGS;
SILICON CARBIDE THIN FILM;
SILICON CARBIDES (SIC);
STABILIZATION OF PHOTODIODES;
THERMAL CARBONIZATION;
POROUS SILICON;
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EID: 84861417306
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: 10.4028/www.scientific.net/MSF.717-720.1283 Document Type: Conference Paper |
Times cited : (8)
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References (10)
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