Stabilization and operation of porous silicon photonic structures from near-ultraviolet to near-infrared using high-pressure water vapor annealing

Thin Solid Films

Volumn 518, Issue 12, 2010, Pages 3276-3279

  Gelloz, Bernard ^a   Koshida, Nobuyoshi ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Photonics; Porous silicon; Stable; Surface passivation; Ultraviolet; Visible

Indexed keywords

BRAGG MIRRORS; GOOD STABILITY; HEAVILY DOPED; HIGH-PRESSURE WATER VAPOR; INDEX CONTRASTS; NEAR INFRARED; PHOTONIC STRUCTURE; STABLE; STABLE SURFACES; SUBSTRATE RESISTIVITY; VISIBLE AND NEAR INFRARED;

ELECTROCHEMICAL CELLS; ELECTROCHEMICAL OXIDATION; ELECTROCHEMICAL PROPERTIES; INFRARED DEVICES; OPTICAL PROPERTIES; PASSIVATION; WATER VAPOR;

POROUS SILICON;

EID: 77649202744     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.08.043     Document Type: Article

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