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Volumn , Issue , 2012, Pages
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Assessment of thermo-mechanical stresses in low temperature joining technology
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Author keywords
[No Author keywords available]
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Indexed keywords
APPLYING PRESSURE;
COPPER SUBSTRATES;
JOINING TECHNOLOGY;
LOW TEMPERATURES;
SILICON MOSFET;
SINTERED JOINT;
SINTERED MATERIALS;
SINTERING PRESSURE;
SINTERING PROCESS;
THERMO-MECHANICAL STRESS;
EXPERIMENTS;
JOINING;
MICROELECTRONICS;
MICROSYSTEMS;
RESIDUAL STRESSES;
TEMPERATURE;
SINTERING;
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EID: 84861355913
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ESimE.2012.6191762 Document Type: Conference Paper |
Times cited : (33)
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References (13)
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