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Volumn , Issue , 2012, Pages

Assessment of thermo-mechanical stresses in low temperature joining technology

Author keywords

[No Author keywords available]

Indexed keywords

APPLYING PRESSURE; COPPER SUBSTRATES; JOINING TECHNOLOGY; LOW TEMPERATURES; SILICON MOSFET; SINTERED JOINT; SINTERED MATERIALS; SINTERING PRESSURE; SINTERING PROCESS; THERMO-MECHANICAL STRESS;

EID: 84861355913     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESimE.2012.6191762     Document Type: Conference Paper
Times cited : (33)

References (13)
  • 1
    • 78651345173 scopus 로고    scopus 로고
    • Characterisation of silver particles used for the Low Temperature Joining Technology
    • Früh, Christiane et al., "Characterisation of silver particles used for the Low Temperature Joining Technology", 3rd ESCTC 2010, Berlin, 2010
    • 3rd ESCTC 2010, Berlin, 2010
    • Früh, C.1
  • 7
    • 84861366425 scopus 로고    scopus 로고
    • Zuverlässigkeit von mittels Niedertemperatur-Verbindungstechnik (NTV) gesinterten Silberschichten
    • Fellbach
    • th EBL 2012, pp. 197-203, Fellbach, 2012
    • (2012) th EBL 2012 , pp. 197-203
    • Früh, C.1
  • 8
    • 81455133445 scopus 로고    scopus 로고
    • Reliability analysis of low temperature low pressure Ag-sinter die attach
    • Boston, MA (USA), June Chapter 3
    • Mroßko, R. et al., "Reliability analysis of low temperature low pressure Ag-sinter die attach" Nanotech 2011 Vol. 2, Boston, MA (USA), June 2011, Chapter 3, pp. 149-154.
    • (2011) Nanotech 2011 , vol.2 , pp. 149-154
    • Mroßko, R.1
  • 9
    • 77950559061 scopus 로고    scopus 로고
    • What is the Young's modulus of silicon
    • April
    • Hopcroft, Matthew A. et al., "What is the Young's modulus of silicon", Journal of Microelectro-mechanical Systems, Vol. 10, Iss. 2 (April 2010), pp. 229-238.
    • (2010) Journal of Microelectro-mechanical Systems , vol.10 , Issue.2 , pp. 229-238
    • Hopcroft, M.A.1
  • 10
    • 0019621281 scopus 로고
    • Thermal expansion reference data: Silicon 300-850 K
    • Oct.
    • Roberts, R.B., "Thermal expansion reference data: silicon 300-850 K", Journal of Physics D: Applied Physics, Vol. 14, No. 10 (Oct. 1981), pp. 163-166
    • (1981) Journal of Physics D: Applied Physics , vol.14 , Issue.10 , pp. 163-166
    • Roberts, R.B.1
  • 11
    • 0041769908 scopus 로고
    • Hüthig GmbH, Heidelberg, Germany
    • Degussa AG, Edelmetalltaschenbuch, Vol. 2, Hüthig GmbH, Heidelberg, Germany, 1995
    • (1995) Edelmetalltaschenbuch , vol.2
    • Degussa, A.G.1
  • 12
    • 68949148771 scopus 로고    scopus 로고
    • Thermo-mechanical reliability during technology development of power chip-on-board
    • September
    • Wunderle, Bernhard et al., "Thermo-mechanical reliability during technology development of power chip-on-board", Journal of Microsystem Technologies, Vol. 15, No. 9 (September 2009), pp. 1467-1478
    • (2009) Journal of Microsystem Technologies , vol.15 , Issue.9 , pp. 1467-1478
    • Wunderle, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.