Etched profile control in anisotropic etching of silicon by TMAH+Triton

Journal of Micromechanics and Microengineering

Volumn 22, Issue 6, 2012, Pages

  Pal, Prem ^a   Gosalvez M A ^b   Sato, K ^c  

^a INDIAN INSTITUTE OF TECHNOLOGY HYDERABAD   (India)

^b UNIVERSITY OF THE BASQUE COUNTRY UPV EHU   (Spain)

^c NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADVERSE EFFECT; CHEMICAL-ETCHING PROCESS; ENGINEERING APPLICATIONS; GALVANIC INTERACTION; MAGNETIC BEADS; MASK PATTERNS; MECHANICAL AGITATION; PROFILE CONTROL; SILICON MEMS; SILICON SURFACES; TETRAMETHYL AMMONIUM HYDROXIDE; TRITON X-100;

CHEMISORPTION; ETHYLENE; MASKS; PHYSISORPTION; SILICON WAFERS; SURFACE ACTIVE AGENTS;

ANISOTROPIC ETCHING;

EID: 84861352751     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/22/6/065013     Document Type: Article

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