Inspired superhydrophobic surfaces by a double-metal-assisted chemical etching route

Materials Research Bulletin

Volumn 47, Issue 7, 2012, Pages 1687-1692

  Chen, Yu ^a,c   Guo, Zhiguang ^a,b   Xu, Jiansheng ^c   Shi, Lei ^a   Li, Jing ^a   Zhang, Yabin ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b HUBEI UNIVERSITY   (China)

^c WUHAN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

A. Interfaces; A. Nanostructures; A. Surface; D. Surface properties

Indexed keywords

CHEMICAL ETCHING; CU NANOPARTICLES; EFFECT OF TEMPERATURE; ETCHING PROCESS; ETCHING TIME; LOW HYSTERESIS; LOW SURFACE ENERGY; METAL-ASSISTED CHEMICAL ETCHING; PHOTOVOLTAICS; SILICON SUBSTRATES; SILICON SURFACES; SOLUTION CONCENTRATION; STATIC CONTACT ANGLE; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBIC; SUPERHYDROPHOBICITY; WIRELIKE STRUCTURES;

CONTACT ANGLE; HYDROPHOBICITY; HYSTERESIS; LITHOGRAPHY; SURFACE PROPERTIES;

ETCHING;

EID: 84861097954     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2012.03.049     Document Type: Article

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