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Volumn 8324, Issue , 2012, Pages

Phase sensitive parametric optical metrology: Exploring the limits of 3-dimensional optical metrology

Author keywords

Electromagnetic simulation; Evaluate sensitivities and uncertainties; Optical metrology; Phase sensitive measurements; Through focus three dimensional field

Indexed keywords

ELECTROMAGNETIC SIMULATION; EVALUATE SENSITIVITIES AND UNCERTAINTIES; OPTICAL METROLOGY; PHASE-SENSITIVE MEASUREMENTS; THROUGH-FOCUS THREE-DIMENSIONAL FIELD;

EID: 84861052047     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916988     Document Type: Conference Paper
Times cited : (7)

References (14)
  • 1
    • 34548496725 scopus 로고    scopus 로고
    • Scatterfield microscopy for extending the limits of image-based optical metrology
    • DOI 10.1364/AO.46.004248
    • R. M. Silver, B. Barnes, R. Attota, J. Jun, M. Stocker, E. Marx, and H. Patrick, "Scatterfield Microscopy to Extend the Limits of Image-based Optical Metrology," Applied Optics, Vol. 46, 20, pp. 4248-4257 (2007). (Pubitemid 47373099)
    • (2007) Applied Optics , vol.46 , Issue.20 , pp. 4248-4257
    • Silver, R.M.1    Barnes, B.M.2    Attota, R.3    Jun, J.4    Stocker, M.5    Marx, E.6    Patrick, H.J.7
  • 3
    • 35148855036 scopus 로고    scopus 로고
    • Zero-order imaging of device-sized overlay targets using scatterfield microscopy
    • B. M. Barnes, L.P. Howard, J. Jun, P. Lipscomb, and R.M. Silver, "Zero-order imaging of device-sized overlay targets using scatterfield microscopy," Proc. SPIE 6518, 65180F (2007).
    • (2007) Proc. SPIE , vol.6518
    • Barnes, B.M.1    Howard, L.P.2    Jun, J.3    Lipscomb, P.4    Silver, R.M.5
  • 7
    • 66649114799 scopus 로고    scopus 로고
    • Angle-resolved scatterfield microscope for linewidth measurement
    • D. M. Shyu, Y. S. Ku, and W. T. Hsu, "Angle-resolved scatterfield microscope for linewidth measurement," Proc. Spie 7272, 72721L (2009).
    • (2009) Proc. Spie , vol.7272
    • Shyu, D.M.1    Ku, Y.S.2    Hsu, W.T.3
  • 8
    • 70449648292 scopus 로고    scopus 로고
    • Critical dimension measurements using a 193 nm scatterfield optical microscope
    • R. Quintanilha, Y. Sohn, B. M. Barnes, L. Howard, and R. Silver, "Critical dimension measurements using a 193 nm scatterfield optical microscope," Proc. SPIE 7390, 73900S (2009).
    • (2009) Proc. SPIE , vol.7390
    • Quintanilha, R.1    Sohn, Y.2    Barnes, B.M.3    Howard, L.4    Silver, R.5
  • 12
    • 24644514839 scopus 로고    scopus 로고
    • CD-AFM reference metrology at NIST and SEMATECH
    • R. Dixson, J. Fu, N. Orji, R. Allen, and M. Cresswell, "CD-AFM Reference metrology at NIST and SEMATECH," Proc. SPIE Vol. 5752-32, (2005)
    • (2005) Proc. SPIE , vol.5752 , pp. 32
    • Dixson, R.1    Fu, J.2    Orji, N.3    Allen, R.4    Cresswell, M.5
  • 14
    • 0029306568 scopus 로고
    • Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: Enhanced transmittance matrix approach
    • M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach," J. Opt. Soc. Am. A 12, 1077-1086 (1995).
    • (1995) J. Opt. Soc. Am. A , vol.12 , pp. 1077-1086
    • Moharam, M.G.1    Pommet, D.A.2    Grann, E.B.3    Gaylord, T.K.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.