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Volumn 520, Issue 15, 2012, Pages 5080-5085
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Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography
a
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Author keywords
Extreme ultraviolet; Filters; High efficiency; Interference lithography; Membrane; Soft X ray; Transmission grating
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Indexed keywords
13.5 NM;
ABSORBER LAYERS;
AMPLITUDE TRANSMISSION;
BROADBAND TRANSMISSION;
COMPARISON WITH A STANDARD;
DOT PATTERNS;
EUV RADIATION;
EXTREME ULTRAVIOLET;
EXTREME ULTRAVIOLETS;
FILTERING PROPERTIES;
GAS-DISCHARGE PLASMAS;
HIGH CONTRAST;
HIGH DENSITY;
HIGH RESOLUTION;
IN-BAND;
INTERFERENCE LITHOGRAPHY;
NANOMETRES;
PROXIMITY PRINTING;
SOFT X-RAY;
SOFT X-RAY RADIATION;
SUB-50 NM;
SUBSTRATE TYPES;
TRANSMISSION GRATINGS;
ELECTRON BEAMS;
FILTERS (FOR FLUIDS);
GAS DISCHARGE TUBES;
MANUFACTURE;
MEMBRANES;
NIOBIUM;
SILICON NITRIDE;
X RAY LITHOGRAPHY;
X RAYS;
WAVE TRANSMISSION;
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EID: 84860289393
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2012.03.036 Document Type: Article |
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Times cited : (30)
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References (15)
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