Stability of polydihydrosilane liquid films on solid substrates

Thin Solid Films

Volumn 520, Issue 15, 2012, Pages 5091-5096

  Masuda, Takashi ^a   Matsuki, Yasuo ^a,c   Shimoda, Tatsuya ^a,b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^c JSR CORPORATION   (Japan)

Author keywords

Hamaker constant; Liquid film; Polydihydrosilane; Polysilane; van der Waals energy

Indexed keywords

HAMAKER CONSTANTS; KEY FACTORS; OPTICAL MICROSCOPES; POLYDIHYDROSILANE; SILICON FILMS; SOLID SUBSTRATES; SOLUTION-PROCESSED; SPECTRUM METHOD; SPINODAL-LIKE DECOMPOSITIONS; STABLE LIQUIDS; SUBSTRATE SYSTEM; VAN DER WAALS; VAN DER WAALS ENERGIES;

LIQUID FILMS; POLYSILANES; SPINODAL DECOMPOSITION; VAN DER WAALS FORCES;

SUBSTRATES;

EID: 84860284322     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.03.043     Document Type: Article

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