Characterization and optoelectronic properties of sol-gel-derived CuFeO 2 thin films

Thin Solid Films

Volumn 520, Issue 15, 2012, Pages 5029-5035

  Chen, Hong Ying ^a   Wu, Jia Hao ^a  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

Author keywords

Annealing; Copper iron oxide; Delafossite; Sol gel deposition; Thin films; Transparent conductive oxide; X ray diffraction

Indexed keywords

AIR-ANNEALING; ANNEALING TEMPERATURES; CHEMICAL COMPOSITIONS; DELAFOSSITE CUFEO; DELAFOSSITES; ELECTRICAL CONDUCTIVITY; HALL COEFFICIENT; HOLE CONDUCTION; OPTOELECTRONIC PROPERTIES; P-TYPE; PREPARATION METHOD; QUARTZ SUBSTRATE; SOL-GEL DEPOSITION; SOL-GEL PROCESSING; THERMODYNAMIC CALCULATIONS; TRANSPARENT CONDUCTIVE OXIDES; TWO-STEP ANNEALING;

ACTIVATION ENERGY; ANNEALING; BINDING ENERGY; COPPER COMPOUNDS; DEPOSITION; ELECTRIC CONDUCTIVITY; IRON OXIDES; PHOTOELECTRONS; QUARTZ; SOL-GELS; STOICHIOMETRY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

SOL-GEL PROCESS;

EID: 84860265959     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.03.032     Document Type: Article

References (25)

1. H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono Nature 389 1997 939
2. M.A. Marquardt, N.A. Ashmore, and D.P. Cann Thin Solid Films 496 2006 146
3. A.N. Banerjee, and K.K. Chattopadhyay Prog. Cryst. Growth Charact. Mater. 50 2005 52
4. D.H. Choi, S.J. Moon, J.S. Hong, S.Y. An, I.-B. Shim, and C.S. Kim Thin Solid Films 517 2009 3987
5. A. Barnabé, E. Mugnier, L. Presmanes, and P. Tailhades Mater. Lett. 60 2006 3468
6. E. Mugnier, A. Barnabé, L. Presmanes, and P. Tailhades Thin Solid Films 516 2008 1453
7. S. Götzendörfer, C. Polenzky, S. Ulrich, and P. Löbmann Thin Solid Films 518 2009 1153
8. S. Götzendörfer, R. Bywalez, and P. Löbmann J. Sol-Gel Sci. Technol. 52 2009 113
9. J. Ding, Y. Sui, W. Fu, H. Yang, S. Liu, Y. Zeng, W. Zhao, P. Sun, J. Guo, H. Chen, and M. Li Appl. Surf. Sci. 256 2010 6441
10. R. Bywalez, S. Götzendörfer, and P. Löbmann J. Mater. Chem. 20 2010 6562
11. G. Li, X. Zhu, H. Lei, H. Jiang, W. Song, Z. Yang, J. Dai, Y. Sun, X. Pan, and S. Dai J. Sol-Gel Sci. Technol. 53 2010 641
12. B. Szyszka, P. Loebmann, A. Georg, C. May, and C. Elsaesser Thin Solid Films 518 2010 3109
13. J. Wang, P. Zheng, D. Li, Z. Deng, W. Dong, R. Tao, and X. Fang J. Alloys Compd. 509 2011 5715
14. Y. Wang, Y. Gu, T. Wang, and W. Shi J. Alloys Compd. 509 2011 5897
15. H.F. Jiang, X.B. Zhu, H.C. Lei, G. Li, Z.R. Yang, W.H. Song, J.M. Dai, Y.P. Sun, and Y.K. Fu J. Alloys Compd. 509 2011 1768
16. Y.F. Wang, Y.J. Gu, T. Wang, and W.Z. Shi J. Sol-Gel Sci. Technol. 59 2011 222
17. H.F. Jiang, X.B. Zhu, H.C. Lei, G. Li, Z.R. Yang, W.H. Song, J.M. Dai, Y.P. Sun, and Y.K. Fu J. Sol-Gel Sci. Technol. 58 2011 12
18. L. Zhang, P. Li, K. Huang, Z. Tang, G. Liu, and Y. Li Mater. Lett. 65 2011 3289
19. A. Banerjee, K.K. Chattopadhyay, and S.W. Joo Phys. B 406 2011 220
20. I. Barin, and G. Platzki Thermochemical Data of Pure Substances 1995 VCH New York 620
21. S.P. Pavunny, A. Kumar, and R.S. Katiyar J. Appl. Phys. 107 2010 013522
22. J. Ghijsen, L.H. Tjeng, J. Van Elp, H. Eskes, J. Westerink, G.A. Sawatzky, and M.T. Czyzyk Phys. Rev. B 38 1988 11322
23. H. Hiraga, T. Makino, T. Fukumura, H. Weng, and M. Kawasaki Phys. Rev. B 84 2011 041411 (R)
24. F.A. Benko, and F.P. Koffyberg J. Phys. Chem. Solids 48 1987 431
25. K.P. Ong, K. Bai, P. Blaha, and P. Wu Chem. Mater. 19 2007 634