Synthesis and photoelectric characterization of delafossite conducting oxides CuAlO 2 laminar crystal thin films via sol-gel method

Applied Surface Science

Volumn 256, Issue 21, 2010, Pages 6441-6446

  Ding, Juan ^a   Sui, Yongming ^a   Fu, Wuyou ^a   Yang, Haibin ^a   Liu, Shikai ^b   Zeng, Yi ^a   Zhao, Wenyan ^a   Sun, Peng ^a   Guo, Jin ^a   Chen, Hui ^a   Li, Minghui ^a  

^a JILIN UNIVERSITY   (China)

^b HENAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

CuAlO 2; Delafossite; Photoelectrochemical activity; Sol gel process; Thin film

Indexed keywords

ALUMINUM COMPOUNDS; CONDUCTIVE FILMS; COPPER COMPOUNDS; ELECTROCHEMISTRY; FILM PREPARATION; NICKEL COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SOL-GEL PROCESS; SUBSTRATES; SURFACE TREATMENT;

CUALO2; CURRENT VOLTAGE ANALYSIS; DELAFOSSITES; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; PHOTOCURRENT DENSITY; PHOTOELECTROCHEMICAL CHARACTERISTICS; PHOTOELECTROCHEMICALS; SURFACE ARCHITECTURES;

THIN FILMS;

EID: 77953232185     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.04.032     Document Type: Article

References (25)

1. Kawazoe H., Yasukawa M., Hyodo H., Kurita M., Yanagi H., and Hosono H. Nature 389 (1997) 939-942
2. Pellicer-Porres J., Segura A., Gilliland A.S., Munoz A., Hernandez P.R., Kim D., Lee M.S., and Kim T.Y. Appl. Phys. Lett. 88 (2006) 181904-1-181904-3
3. Zheng X.G., Taniguchi K., Takahashi A., Liu Y., and Xu C.N. Appl. Phys. Lett. 85 (2004) 1728-1729
4. Tonooka K., Bando H., and Oiura Y. Thin Solid Films 445 (2003) 327-331
5. Chopra K.L., Major S., and Pandya D.K. Thin Solid Films 102 (1983) 1-46
6. Minami T. Semicond. Sci. Technol. 20 (2005) S35-S44
7. Huda M.N., Yan Y., Walsh A., Wei S.-H., and Al-Jassim M.M. Appl. Phys. Lett. 94 (2009) 251907-1-251907-3
8. Falabretti B., and Robertson J. J. Appl. Phys. 102 (2007) 123703-1-123703-5
9. Gao S.M., Zhao Y., Gou P.P., Chen N., and Xie Y. Nanotechnology 14 (2003) 538-541
10. Ueda K., Hase T., Yanagi H., Kawazoe H., Hosono H., Ohta H., Orita M., and Hirano M. J. Appl. Phys. 89 (2001) 1790-1793
11. Fuflyigin V., Salley E., Vakhutinsky P., Osinsky A., and Zhao J. Appl. Phys. Lett. 78 (2001) 365-367
12. Ueda K., Inoue S., Hirose S., Kawazoe H., and Hosono H. Appl. Phys. Lett. 77 (2000) 2701-2703
13. Gong H., Wang Y., and Luo Y. Appl. Phys. Lett. 76 (2000) 3959-3961
14. Manoj K., Singh S., Dussan L., Ganpat, and Sharma. J. Appl. Phys. 104 (2008) 113503-1-113503-4
15. Dittrich Th., Dloczik L., Guminskaya T., Lux-Steiner M.Ch., Grigorieva N., and Urban I. Appl. Phys. Lett. 94 (2004) 85742-85744
16. Gotzendorfer S., Polenzky C., Ulrich S., and Lobmann P. Thin Solid Films 518 (2009) 1153-1156
17. Mahrov B., Boschloo G., Hagfeldt A., Dloczik L., and Dittrich Th. Appl. Phys. Lett. 84 (2004) 5455-5457
18. Lee M.S., Kim T.Y., and Kim D. Appl. Phys. Lett. 79 (2001) 2028-2030
19. Luo H.M., Menka J., McCleskey T.M., Bauer E., Burrell A.K., and Jia Q.x. Adv. Mater. 19 (2007) 3604-3607
20. Banerjee A.N., Kundoo S., and Chattopadhyay K.K. Thin Solid Films 440 (2003) 5-10
21. Cai J.L., and Gong H. J. Appl. Phys. 98 (2005) 033707-1-033707-5
22. Huda M.N., Yan Y., Walsh A., Wei S.-H., and Al-Jassim M.M. Phys. Rev. B (2009) 035205-1-035205-7
23. Honda S., Itoh H., Inoue J., Kurebayashi H., Trypiniotis T., Barnes C.H.W., Hirohata A., and Bland J.A.C. Phys. Rev. B 78 (2008) 245316-1-245316-6
24. Liu S.K., Fu W.Y., Yang H.B., Li M.H., Sun P., Luo B.M., Yu Q.J., Wei R.H., Yuan M.X., Zhang Y.Y., Ma D., Li Y.X., and Zou G.T. J. Phys. Chem. C 112 (2008) 19852-19859
25. Khaselev O., and Turner J.A. Science 280 (1998) 425-427