Preparation of delafossite CuFeO2 thin films by rf-sputtering on conventional glass substrate

Materials Letters

Volumn 60, Issue 29-30, 2006, Pages 3468-3470

  Barnabe A ^a   Mugnier, E ^a   Presmanes, L ^a   Tailhades, Ph ^a  

^a UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

Delafossite; Oxide; Rf sputtering; Synthesis; Thin film

Indexed keywords

COPPER COMPOUNDS; ELECTRIC CONDUCTIVITY; SEMICONDUCTOR MATERIALS; SPUTTERING; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL);

DELAFOSSITE; GLASS SUBSTRATES; RADIO-FREQUENCY SPUTTERING;

THIN FILMS;

EID: 33750335202     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2006.03.033     Document Type: Article

References (15)

1. Ginley D.S., and Bright C. MRS Bull. 25 (2000) 15-18
2. Kawazoe H., Yanagi H., Ueda K., and Hosono H. MRS Bull. 25 (2000) 28-36
3. Kawazoe H., Yasukawa M., Hyodo H., Kurita M., Yanagi H., and Hosono H. Nature 389 (1997) 939-942
4. Shannon R.D., Rogers D.B., and Prewitt C.T. Inorg. Chem. 10 (1971) 713-718
5. Doumerc J.P., Ammar A., Wichainchai A., Pouchard M., and Hagenmuller P. J. Phys. Chem. Solids 48 (1987) 37-43
6. Schaefer S.C., Hundley G.L., Block F.E., Mc Cune R.A., and Mrazek R.V. Metall. Trans. 1 (1970) 2557-2563
7. Sheets W.C., Mugnier E., Barnabé A., Marks T.J., and Poeppelmeier K.R. Chem. Mater. 18 1 (2006) 7-20
8. Otabe T., Ueda K., Kudoh A., Hosono H., and Kawazoe H. Appl. Phys. Lett. 72 (1998) 1036-1038
9. Nagarajan R., Duan N., Jayaraj M.K., Li J., Vanaja K.A., Yokochi A., Draeseke A., Tate J., and Sleight A.W. Int. J. Inorg. Mater. 3 (2001) 265-270
10. Banerjee A.N., Kundoo S., and Chattopadhyay K.K. Thin Solid Films 440 (2003) 5-10
11. Tsuboi N., Takahashi Y., Kobayashi S., Shimizu H., Kato K., and Kaneko F. J. Phys. Chem. Solids 64 (2003) 1671-1674
12. Benko F.A., and Koffyberg F.P. J. Phys. Chem. Solids 48 (1987) 431-434
13. Ingram B.J., Harder B.J., Hrabe N.W., Mason T.O., and Poeppelmeier K.R. Chem. Mater. 16 (2004) 5623-5629
14. Mugnier E., Barnabé A., and Tailhades Ph. Solid State Ionics 177 5-6 (2006) 607-612
15. Capdeville S., Alphonse P., Bonningue C., Presmanes L., and Tailhades P. J. Appl. Phys. 96 (2004) 6142-6146