Patterning of Bi 2O 3 films using laser-induced forward and backward transfer techniques

Microelectronic Engineering

Volumn 96, Issue , 2012, Pages 56-60

  Sakata, H ^a   Chakraborty, S ^a   Wakaki, M ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

AFM; Bi 2O 3 film; Laser induced backward transfer; Laser induced forward transfer; SEM; SHG Nd:YAG laser

Indexed keywords

AFM; AFM IMAGE; AIR-GAPS; FILM MATERIALS; FILM SURFACES; GLASS PLATE; GLASS SAMPLES; INCIDENT LASER; LASER INDUCED; LASER INDUCED FORWARD TRANSFER; LIFT METHOD; ND : YAG LASERS; ND:YAG PULSED LASER; SEM OBSERVATION; SKIN DEPTH; SKIN DEPTH EFFECTS; TRANSFER TECHNIQUE;

GLASS; MASS TRANSFER; NEODYMIUM; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; VAPORS;

NEODYMIUM LASERS;

EID: 84859886000     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2012.02.002     Document Type: Article

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