Room-temperature continuous wave lasing in deep-subwavelength metallic cavities under electrical injection

Physical Review B - Condensed Matter and Materials Physics

Volumn 85, Issue 4, 2012, Pages

  Ding, K ^a   Liu, Z C ^a   Yin, L J ^a   Hill, M T ^b   Marell, M J H ^b   Van Veldhoven, P J ^b   Noetzel R ^b   Ning, C Z ^a  

^a AZ 85281   (United States)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84859339930     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.85.041301     Document Type: Article

References (35)

1. M. I. Stockman, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett. 106.156802 106, 156802 (2011).
2. D. J. Bergman and M. I. Stockman, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.90.027402 90, 027402 (2003).
3. M. T. Hill, Y. S. Oei, B. Smalbrugge, Y. Zhu, T. de Vries, P. J. van Veldhoven, F. W. M. van Otten, T. J. Eijkemans, J. P. Turkiewicz, H. de Waardt, E. J. Geluk, S. H. Kwon, Y. H. Lee, R. Nötzel, and M. K. Smit, Nat. Photonics 1749-4885 10.1038/nphoton.2007.171 1, 589 (2007).
4. M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y. S. Oei, R. Nötzel, C. Z. Ning, and M. K. Smit, Opt. Express OPEXFF 1094-4087 10.1364/OE.17.011107 17, 11107 (2009).
5. R. F. Oulton, V. J. Sorger, T. Zentgraf, R. Ma, C. Gladden, L. Dai, G. Bartal, and X. Zhang, Nature (London) 0028-0836 10.1038/nature08364 461, 629 (2009).
6. M. P. Nezhad, A. Simic, O. Bondarenko, B. Slutsky, A. Mizrahi, L. Feng, V. Lomakin, and Y. Fainman, Nat. Photonics 1749-4885 10.1038/nphoton.2010.88 4, 395 (2010).
7. K. Yu, A. Lakhani, and M. C. Wu, Opt. Express OPEXFF 1094-4087 10.1364/OE.18.008790 18, 8790 (2010).
8. S. H. Kwon, J. H. Kang, C. Seassal, S. K. Kim, P. Regreny, Y. H. Lee, C. M. Lieber, and H. G. Park, Nano Lett. NALEFD 1530-6984 10.1021/nl1021706 10, 3679 (2010).
9. M. A. Noginov, G. Zhu, A. M. Belgrave, R. Bakker, V. M. Shalaev, E. E. Narimanov, S. Stout, E. Herz, T. Suteewong, and U. Wiesner, Nature (London) 0028-0836 10.1038/nature08318 460, 1110 (2009).
10. C. Z. Ning, Phys. Status Solidi B 247, 774 (2010).
11. C. Sirtori, C. Gmachl, F. Capasso, J. Faist, D. L. Sivco, A. L. Hutchinson, and A. Y. Cho, Opt. Lett. OPLEDP 0146-9592 10.1364/OL.23.001366 23, 1366 (1998).
12. According to the Drude model, metal absorption is proportional to the resistivity, dominated by phonon scatterings which are stronger at RT than at low temperature. The resistivity increases by a factor of 5 from 77 to 273 K [see G. W. C. Kaye and T. H. Laby, Table of Physical and Chemical Constants (Longmans Green, London, 1966)];
13. Other measurements also showed an increased metal loss at higher photon energies above 2 eV [see R. H. M. Groeneveld, R. Sprik, and A. Lagendijk, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.64.784 64, 784 (1990)].
14. A. V. Maslov and C. Z. Ning, Proc. SPIE 10.1117/12.723786 6468, 64680I (2007). (Pubitemid 46761923)
15. C. Y. Lu, S. W. Chang, S. L. Chuang, T. D. Germann, and D. Bimberg, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.3455316 96, 251101 (2010).
16. A. F. J. Lev, S. L. McCall, S. J. Pearton, and R. A. Logan, IEEE Electron. Lett. 0013-5194 10.1049/el:19931109 29, 1666 (1993).
17. T. Baba, P. Fujita, A. Sakai, M. Kihara, and R. Watanabe, IEEE Photonics Technol. Lett. IPTLEL 1041-1135 10.1109/68.593330 9, 878 (1997).
18. K. Srinivasan, M. Borselli, O. Painter, A. Stintz, and S. Krishna, Opt. Express OPEXFF 1094-4087 10.1364/OE.14.001094 14, 1094 (2006). (Pubitemid 43245703)
19. J. P. Zhang, D. Y. Chu, S. L. Wu, S. T. Ho, W. G. Bi, C. W. Tu, and R. C. Tiberio, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.75.2678 75, 2678 (1995).
20. H. G. Park, S. H. Kim, S. H. Kwon, Y. G. Ju, J. K. Yang, J. H. Baek, S. B. Kim, and Y. H. Lee, Science SCIEAS 0036-8075 10.1126/science.1100968 305, 1444 (2004). (Pubitemid 39167659)
21. K. Nozaki, H. Watanabe, and T. Baba, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2831916 92, 021108 (2008).
22. S. Tomljenovic-Hanic, C. M. de Sterke, M. J. Steel, B. J. Eggleton, Y. Tanaka, and S. Noda, Opt. Express OPEXFF 1094-4087 10.1364/OE.15.017248 15, 17248 (2007).
23. A. J. Danner, J. C. Lee, J. J. Raftery, N. Yokouchi, and K. D. Choquette, Electron. Lett. ELLEAK 0013-5194 10.1049/el:20030866 39, 1323 (2003).
24. M. H. Huang, S. Mao, H. Feick, H. Yan, Y. Wu, H. Kind, E. Weber, R. Russo, and P. Yang, Science SCIEAS 0036-8075 10.1126/science.1060367 292, 1897 (2001). (Pubitemid 32538361)
25. R. Chen, T. T. D. Tran, K. W. Ng, W. S. Ko, L. C. Chuang, F. G. Sedgwick, and C. Chang-Hasnain, Nat. Photonics 1749-4885 10.1038/nphoton.2010.315 5, 170 (2011).
26. R. Yan, D. Gargas, and P. Yang, Nat. Photonics 1749-4885 10.1038/nphoton.2009.184 3, 569 (2009).
27. X. F. Duan, Y. Huang, R. Agarwal, and C. M. Lieber, Nature (London) 0028-0836 10.1038/nature01353 421, 241 (2003). (Pubitemid 36139123)
28. See Supplemental Material at http://link.aps.org/supplemental/10.1103/ PhysRevB.85.041301 for details of device fabrication, optical measurement setup, longitudinal mode verification and simulation for device 1.
29. S. J. Adachi, Appl. Phys. 10.1063/1.343580 66, 6030 (1989).
30. H. Haug and H. Haken, Z. Phys. ZEPYAA 1434-6001 10.1007/BF01326200 204, 262 (1967).
31. C. H. Henry, IEEE J. Quantum Electron. IEJQA7 0018-9197 10.1109/JQE.1982.1071522 18, 259 (1982).
32. C. Z. Ning, W. W. Chow, D. J. Bossert, R. A. Indik, and J. V. Moloney, IEEE J. Sel. Top. Quantum Electron. IJSQEN 1077-260X 10.1109/2944.605642 3, 129 (1997).
33. C. A. Balanis, Advanced Engineering Electromagnetics (Wiley, New York, 1989), p. 329.
34. A. V. Maslov and C. Z. Ning, IEEE J. Quantum Electron. IEJQA7 0018-9197 10.1109/JQE.2004.834767 40, 1389 (2004).
35. D. B. Li and C. Z. Ning, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.3425896 96, 181109 (2010).