Preparation of ZnO/SiO 2 gel composites and their performance of H 2S removal at room temperature

Journal of Hazardous Materials

Volumn 215-216, Issue , 2012, Pages 166-172

  Liu, Guoqiang ^a   Huang, Zheng Hong ^a   Kang, Feiyu ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Desulphurization; Gel composite; Hydrogen sulfide; Silica; Zinc oxide

Indexed keywords

ACTIVE COMPONENTS; ADSORPTION CAPACITIES; AMBIENT DRYING; DESULPHURIZATION; DYNAMIC TESTING; FTIR; HIGH SURFACE AREA; LOADING AMOUNT; LOADING RATIO; MESOPORE; MICROPORES; MULTI-MODAL; NITROGEN ADSORPTION; POROUS PROPERTIES; POROUS STRUCTURES; REMOVAL PROCESS; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPIES (SEM); X RAY PHOTOELECTRON SPECTROSCOPIES (XPS); ZINC OXIDE (ZNO); ZNO;

GAS ADSORPTION; HYDROGEN SULFIDE; LOADING; PHYSISORPTION; POLYACRYLONITRILES; SCANNING ELECTRON MICROSCOPY; SILICA; SOL-GEL PROCESS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

DESULFURIZATION;

HYDROGEN SULFIDE; NITROGEN; SILICON DIOXIDE; ZINC OXIDE; SILICA GEL;

ADSORPTION; GEL; NITROGEN; OXIDE; POLLUTANT REMOVAL; SCANNING ELECTRON MICROSCOPY; SILICA; SORPTION; SULFIDE; TEMPERATURE EFFECT; X-RAY DIFFRACTION; X-RAY SPECTROSCOPY;

ADSORPTION; ARTICLE; DESULFURIZATION; GEL; GELATION; HEAT TREATMENT; INFRARED SPECTROSCOPY; POROSITY; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; CHEMISTRY; TEMPERATURE;

ADSORPTION; HYDROGEN SULFIDE; SILICA GEL; TEMPERATURE; ZINC OXIDE;

EID: 84859267200     PISSN: 03043894     EISSN: 18733336     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2012.02.050     Document Type: Article

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