Annealing effects in Ag-doped amorphous carbon films deposited by dc magnetron sputtering

Surface and Coatings Technology

Volumn 206, Issue 16, 2012, Pages 3450-3453

  Onoprienko, A A ^a   Danylenko, M I ^a  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

Author keywords

Amorphous carbon; Sputtering; Structure; Transmission electron microscopy

Indexed keywords

AG ATOMS; AMORPHOUS CARBON MATRIX; ANNEALING EFFECTS; AVERAGE DIAMETER; DC MAGNETRON SPUTTERING; DENSITY OF PARTICLES; DIFFUSION TRANSPORT; FILM MICROSTRUCTURES; SILVER NANOPARTICLES; THIN CARBON FILMS; TRANSMISSION ELECTRON MICROSCOPY (TEM);

AMORPHOUS CARBON; CARBON FILMS; COALESCENCE; SPUTTERING; STRUCTURE (COMPOSITION); TRANSMISSION ELECTRON MICROSCOPY;

SILVER;

EID: 84859000032     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.02.004     Document Type: Article

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