XPS investigation of a CdS-based photoresistor under working conditions: Operando-XPS

Analytical Chemistry

Volumn 84, Issue 6, 2012, Pages 2990-2994

  Sezen, Hikmet ^a   Rockett, Angus A ^b   Suzer, Sefik ^a  

^a BILKENT UNIVERSITY   (Turkey)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AREAL MEASUREMENT; CHEMICAL NATURE; CORE-LEVEL PEAKS; ELECTRICAL MEASUREMENT; ELECTRICAL POTENTIAL; LINE SCAN; LOCATION DEPENDENTS; NON-CONTACT; OPERANDO; PEAK POSITION; PHOTOILLUMINATION; POTENTIAL VARIATIONS; RESISTANCE VALUES; SURFACE DOMAINS; WORKING CONDITIONS; X RAY PHOTOELECTRON SPECTROSCOPIES (XPS);

BINDING ENERGY; CADMIUM COMPOUNDS; CADMIUM SULFIDE; CHEMICAL DETECTION; PHOTORESISTORS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84858732396     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac300220u     Document Type: Article

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