Correlation between Aluminum alloy sputtering target metallurgical characteristics, Arc initiation, and in-film defect density

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3214, Issue , 1997, Pages 42-47

  Pavate, Vikram ^a   Abburi, Murali ^a   Chiang, Sunny ^a   Hansen, Keith ^a   Mori, Glen ^a   Narasimhan, Murali ^a   Ramaswami, Sesh ^a   Nulman, Jaim ^a   Restaino, Daryl ^b  

^a APPLIED MATERIALS INC   (United States)

^b IBM   (United States)

Author keywords

Aluminum sputtering; In film defects; Target metallurgy; Unipolar arcs

Indexed keywords

ALLOY SPUTTERING; ALUMINA INCLUSIONS; ALUMINUM DEPOSITIONS; ALUMINUM FILMS; ALUMINUM SPUTTERING; COMMUNITY IS; DEFECT GENERATIONS; IMPACT DEVICES; IN-FILM DEFECTS; INTERCONNECT METALLIZATION; MANUFACTURING ENVIRONMENTS; MANUFACTURING PROCESSES; METAL DEPOSITIONS; METALLIZATION; METALLURGICAL CHARACTERISTICS; OXYGEN CONTENTS; PARETO ANALYSES; SEMICONDUCTOR MANUFACTURING; SHRINKING DEVICES; SYSTEMATIC INVESTIGATIONS; UNIPOLAR ARCS;

ALLOYS; ALUMINA; ALUMINUM; ALUMINUM ALLOYS; ALUMINUM METALLURGY; DEFECT DENSITY; DEFECTS; MANUFACTURE; METALLIC FILMS; METALLIZING; METALLURGY; ORES; OXYGEN; SPUTTER DEPOSITION; TARGETS;

LIGHT METALS;

EID: 0002594621     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284663     Document Type: Conference Paper

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