Novel fabrication method for ZnO films via nitrogen-mediated crystallization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8263, Issue , 2012, Pages

  Itagaki, N ^a,b   Kuwahara, K ^a   Matsushima, K ^a   Oshikawa, K ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

buffer layer; epitaxial growth; erosion; magnetron sputtering; nitrogen mediated crystallization; spatial distribution; transparent conducting oxide; zinc oxide

Indexed keywords

AZO FILMS; C-PLANE SAPPHIRE SUBSTRATES; CRYSTAL GRAIN SIZE; CRYSTALLINITIES; FABRICATION METHOD; HIGH QUALITY; INITIAL STAGES; NUCLEI DENSITY; ROCKING CURVES; SPUTTERING METHODS; TRANSPARENT CONDUCTING OXIDE; ZINC OXIDE (ZNO); ZNO; ZNO FILMS;

EPITAXIAL GROWTH; EROSION; FABRICATION; MAGNETRON SPUTTERING; METALLIC FILMS; NITROGEN; OPTICAL FILMS; OPTICAL WAVEGUIDES; SPATIAL DISTRIBUTION; ZINC OXIDE;

BUFFER LAYERS;

EID: 84858593275     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.911971     Document Type: Conference Paper

References (11)

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