High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers

Thin Solid Films

Volumn 520, Issue 14, 2012, Pages 4674-4677

  Kuwahara, Kazunari ^a   Itagaki, Naho ^a   Nakahara, Kenta ^a   Yamashita, Daisuke ^a   Uchida, Giichiro ^a   Kamataki, Kunihiro ^a   Koga, Kazunori ^a   Shiratani, Masaharu ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Buffer layer; Epitaxy; Light emitting diode; Magnetron sputtering; Solid phase crystallization; Zinc oxide

Indexed keywords

EPITAXIALLY GROWN; HIGH CRYSTALLINITY; HIGH QUALITY; HOMO-BUFFER LAYERS; RF-MAGNETRON SPUTTERING; SAPPHIRE SUBSTRATES; SOLID PHASE CRYSTALLIZATION; SOLID-PHASE; XRD PATTERNS; ZNO; ZNO CRYSTALS; ZNO FILMS;

AMORPHOUS FILMS; EPITAXIAL GROWTH; FABRICATION; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL WAVEGUIDES; SAPPHIRE; ZINC OXIDE;

BUFFER LAYERS;

EID: 84860295772     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.10.136     Document Type: Conference Paper

References (16)

1. N. Itagaki, T. Iwasaki, H. Kumomi, T. Den, K. Nomura, T. Kamiya, and H. Hosono Phys. Stat. Sol. (a) 205 2008 1915
2. Z.K. Tang, G.K.L. Wong, P. Yu, M. Kawasaki, A. Ohtomo, H. Koinuma, and Y. Segawa Appl. Phys. Lett. 72 1998 3270
3. T. Nakamura, Y. Yamada, T. Kusumori, H. Minoura, and H. Muto Thin Solid Films 411 2002 60
4. V. Craciun, J. Perriere, N. Bassim, R.K. Singh, D. Craciun, and J. Spear Appl. Phys. A Mater. Sci. Process 69 1999 531
5. G. Hrbeke, L. Krausbauer, E.F. Steigmeier, A.E. Widmer, H.F. Kappert, and G. Neugebauer Appl. Phys. Lett. 42 1983 249
6. T. Koida, H. Fujiwara, and M. Kondo Jpn. J. Appl. Phys. 46 2007 L685
7. T. Koida, M. Kondo, K. Tsutsumi, A. Sakaguchi, M. Suzuki, and H. Fujiwara J. Appl. Phys. 107 2010 033514
8. S. Ishibashi, Y. Higuchi, Y. Ohta, and K. Nakamura J. Vac. Sci. Technol., A 8 1990 1399
9. E. Nishimura, M. Ando, K. Onisawa, M. Takabatake, and T. Minemura Jpn. J. Appl. Phys. 35 1996 2788
10. N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Koga, and M. Shiratani Appl. Phys. Express 4 2011 011101
11. C.H. Park, S.B. Zhang, and S.-H. Wei Phys. Rev. B 66 2002 073202
12. M. Nistor, N.B. Mandache, J. Perrière, C. Hebert, F. Gherendi, and W. Seiler Thin Solid Films 519 2011 3959
13. O. Pons-Y-Moll, J. Perdiere, E. Million, R.M. Defourneau, D. Defourneau, B. Vincent, A. Essahiaoui, and A. Boudrioua J. Appl. Phys. 92 2002 4885
14. J.B. Baxter, and E.S. Aydil J. Cryst. Growth 274 2005 407
15. K. Maejima, M. Ueda, S. Fujita, and S. Fujita Jpn. J. Appl. Phys. 42 2003 2600
16. Y. Masaki, P.G. LeComber, and A.G. Fitzgerald J. Appl. Phys. 74 1993 129