Effect of sublayer surface treatments on ZnO transparent conductive oxides using dc magnetron sputtering

Thin Solid Films

Volumn 518, Issue 11, 2010, Pages 2945-2948

  Imanishi, Yasuo ^a   Taguchi, Mitsuo ^a   Onisawa, Ken ichi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Abrasive finishing; Aluminum doped zinc oxide (ZnO:Al); dc magnetron sputtering (dc MSP); Glass substrate; Resistivity; Sputter beam control; Sublayer surface treatments; Transparent conductive oxide (TCO)

Indexed keywords

ABRASIVE FINISHING; ALUMINUM-DOPED ZINC OXIDE; BEAM CONTROL; DC MAGNETRON SPUTTERING; GLASS SUBSTRATES; SPUTTER BEAM CONTROL; TRANSPARENT CONDUCTIVE OXIDES; ZNO;

ABRASIVES; ALUMINUM; ELECTRON MOBILITY; GLASS; MAGNETRON SPUTTERING; MAGNETRONS; OXYGEN; SUBSTRATES; ZINC; ZINC OXIDE;

SURFACE TREATMENT;

EID: 77649160167     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.09.198     Document Type: Article

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