Preparation of regularly structured nanotubular TiO 2 thin films on ITO and their modification with thin ALD-grown layers

Nanotechnology

Volumn 23, Issue 12, 2012, Pages

  Tupala, Jere ^a   Kemell, Marianna ^a   Härkönen, Emma ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS TITANIA; ANODIZATIONS; COATED GLASS; DIFFERENT STRUCTURE; FACILE METHOD; INDIUM TIN OXIDE; NANOTUBULAR; OPTIMUM THICKNESS; THIN LAYERS; TIO; TITANIUM DIOXIDE FILMS; TITANIUM DIOXIDE THIN FILM; TITANIUM FILM; TITANIUM METALS;

ADHESION; ALUMINA; AMORPHOUS FILMS; ATOMIC LAYER DEPOSITION; ELECTRIC PROPERTIES; FILM GROWTH; INDIUM COMPOUNDS; NANOTUBES; THIN FILMS; TIN; TIN OXIDES; TITANIUM; TITANIUM DIOXIDE;

FILM PREPARATION;

EID: 84858437126     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/12/125707     Document Type: Article

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